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Creating oxide interfaces with precise chemical specificity at the atomic layer level is desired for the engineering of quantum phases and electronic applications, but highly challenging, owing partially to the lack of in situ tools to monitor the chemical composition and completeness of the surface layer during growth. Here we report the in situ observation of atomic layer-by-layer inner potential variations by analysing the Kikuchi lines during epitaxial growth of strontium titanate, providing a powerful real-time technique to monitor and control the chemical composition during growth. A model combining the effects of mean inner potential and step edge density (roughness) reveals the underlying mechanism of the complex and previously not well-understood reflection high-energy electron diffraction oscillations observed in the shuttered growth of oxide films. General rules are proposed to guide the synthesis of atomically and chemically sharp oxide interfaces, opening up vast opportunities for the exploration of intriguing quantum phenomena at oxide interfaces.

Ferroelectric domain wall memories have been proposed as a promising candidate for nonvolatile memories, given their intriguing advantages including low energy consumption and high-density integration. Perovskite oxides possess superior ferroelectric prosperities but perovskite-based domain wall memory integrated on silicon has rarely been reported due to the technical challenges in the sample preparation. Here, we demonstrate a domain wall memory prototype utilizing freestanding BaTiO3 membranes transferred onto silicon. While as-grown BaTiO3 films on (001) SrTiO3 substrate are purely c-axis polarized, we find they exhibit distinct in-plane multidomain structures after released from the substrate and integrated onto silicon due to the collective effects from depolarizing field and strain relaxation. Based on the strong in-plane ferroelectricity, conductive domain walls with reading currents up to nanoampere are observed and can be both created and erased artificially, highlighting the great potential of the integration of perovskite oxides with silicon for ferroelectric domain wall memories.

Interfacial thermal transport plays a prominent role in the thermal management of nanoscale objects and is of fundamental importance for basic research and nanodevices. At metal/insulator interfaces, a configuration commonly found in electronic devices, heat transport strongly depends upon the effective energy transfer from thermalized electrons in the metal to the phonons in the insulator. However, the mechanism of interfacial electron–phonon coupling and thermal transport at metal/insulator interfaces is not well understood. Here, the observation of a substantial enhancement of the interfacial thermal resistance and the important role of surface charges at the metal/ferroelectric interface in an Al/BiFeO3 membrane are reported. By applying uniaxial strain, the interfacial thermal resistance can be varied substantially (up to an order of magnitude), which is attributed to the renormalized interfacial electron–phonon coupling caused by the charge redistribution at the interface due to the polarization rotation. These results imply that surface charges at a metal/insulator interface can substantially enhance the interfacial electron–phonon‐mediated thermal coupling, providing a new route to optimize the thermal transport performance in next‐generation nanodevices, power electronics, and thermal logic devices.

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Perovskite oxide SrTiO3 can be electron-doped and exhibits high mobility by introducing oxygen vacancies or dopants such as Nb or La. A reversible after-growth tuning of high mobility carriers in SrTiO3 is highly desired for the applications in high-speed electronic devices. Here, we report the observation of tunable high-mobility electrons in layered perovskite/perovskite (Sr n+1Ti n O3n+1/SrTiO3) heterostructure. By use of Sr n+1Ti n O3n+1 as the oxygen diffusion barrier, the oxygen vacancy concentration near the interface can be reversibly engineered by high-temperature annealing or infrared laser heating. Because of the identical elemental compositions (Sr, Ti, and O) throughout the whole heterostructure, interfacial ionic intermixing is absent, giving rise to an extremely high mobility (exceeding 55000 cm2 V–1 s–1 at 2 K) in this type of oxide heterostructure. This layered perovskite/perovskite heterostructure provides a promising platform for reconfigurable high-speed electronic devices.