Mechanical instabilities of periodic soft nanostructures and their interaction with the deformation of a base
could lead to collective buckling. Our theoretical calculations suggest multiple modes of buckling associated
with distinctive potential energies. This theoretical discovery allowed us to selectively promote certain buckling
modes through experiments as an unusual approach for nanolithography. One typical example includes reducing
the feature size in a selectively buckled grating from a pitch of 200 to 130 nm.
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