We designed a patterned composite alignment thin film structure using a horizontal alignment polyimide (PI) layer and vertical alignment liquid crystal polymer (LCP) pillars. The LCP polymer precursor concentration was varied at 0-10% and the pillars were introduced by a photolithography process. Both single-sided and double-sided liquid crystal display cells were assembled for a series of electro-optical characterization techniques. The horizontal PI alignment layer alone had a designated control of the pre-tilt angle of 7 degrees after the prescribed mechanical rubbing process. The pre-tilt angle was improved to 24 degrees when the LCP precursor concentration was 5%. It was further increased to 61 degrees at the concentration of 10%. In addition, the study on the electrical response time and gray level variation demonstrated promising results for potential applications. The field-on response time was only 2.79 ms and the field-off response time was 0.35 ms for the double-sided liquid crystal display cells using a ramping voltage of 5.5 V. The effective control of the cell pre-tilt angle suggested that the display power consumption and response time would be greatly improved.
Silicon nitride (SiNx), an important material used as a dielectric layer and passivation layer in thin film transistor liquid crystal display (TFT LCD) was patterned by a non-lithographic process. SiNx was deposited by plasma enhanced chemical vapor deposition (PECVD) on glass substrate. Laser photoablation can effectively pattern 5 µm diameter with 200 nm depth hole in SiNx thin films with laser photoablation. The threshold remove fluence is 1350 mJ/cm2 with 1 laser irradiation shot. The contact-hole taper angle as a function of the laser irradiation shot number. The taper angle increased with increasing the laser irradiation shot number. The contact-hole taper angle etched profile was successfully controlled by vary the laser irradiation shot number.
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