Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography Design and development of plasma enhanced chemical vapor deposition universal antireflective layer films for deep subquarter micron deep ultraviolet applications A new bilayer bottom antireflective coating ͑BARC͒ layer composed of hexamethyldisiloxane film stack is demonstrated for both KrF and ArF lithographies. By simply adjusting the gas flow rate ratio, the materials of the bilayer can be varied to have suitable optical constants as BARC materials working at both 248 and 193 nm wavelengths. The swing effect is experimentally shown to be reduced significantly on both silicon and Al-Si substrates. The bilayer scheme is also demonstrated to be capable of providing large thickness-controlled tolerance.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.