The below bandgap infrared transmission (up to 25 µm) in undoped Ga 1-x In x Sb bulk crystals has been studied for the first time and found to be limited by native defects such as antisites and vacancies found in antimonide-based III-V compounds. For the gallium-rich alloy compositions (x Ͻ 0.5 in Ga 1-x In x Sb), the crystals exhibit p-type conductivity with an increase in net acceptor concentration and an increase in gallium content in the crystals. For x Ͼ 0.5 (the indium-rich alloy compositions), the crystals exhibit n-type conductivity when the net donor concentration and indium content in the crystals increase. A correlation between the optical transmission and the residual carrier concentration arising from the native acceptors and donors has been observed. Due to donor-acceptor compensation, crystals with alloy compositions in the range of x ϭ 0.5-0.7 exhibit high optical transmission for a wide wavelength range (up to 22 µm). The light hole to heavy hole interband transition in the valence band and the free electron absorption in the conduction band have been found to be the two dominant absorption processes.
Surfaces of GaSb substrates currently available from various commercial vendors are nowhere close to device grade GaAs, Si or InP wafer surfaces. Hence epitaxial growth and device fabrication on as-received commercial substrates poses significant difficulties amongst antimonide based researchers. Antimonide based materials are known to have poor surface oxide quality and not so well understood chemical reactions with various chemicals used to remove the oxides prior to growth. There are no existing reports on the detailed recipe for the preparation of "atomically flat and clean" surfaces that works on wafers obtained from various commercial vendors. This paper presents a detailed recipe for obtaining atomically flat and clean GaSb surfaces, irrespective of the initial polishing source. The same recipe (with slight modification) has been found to be successful with other III-V and II-VI compounds. The novel surface preparation process developed in our laboratory includes, chemical-mechanical polishing using an agglomerate-free sub-micron alumina slurry on a soft pad such as velvet, surface cleaning using dilute ammonium or potassium hydroxide-H 2 O solution and surfactant or glycerol, surface degreasing using organic solvents, oxide desorption using HCl-H 2 O and HF-H 2 O mixtures, mild chemical etching using ammonium sulfide and a final rinse in high purity deionized (DI) water and methanol. Using this recipe, we have been able to achieve surfaces with atomic flatness (RMS surface roughness close to 0.5 nm over a 10 x 10 µm 2 ) and extremely clean surfaces, irrespective of the initial contamination or the sources of the wafers. Results of wafer surfaces before and after polishing using our recipe will be presented.
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