The effect of the high pulse current and the duty cycle on the deposition rate in high power pulsed magnetron sputtering (HPPMS) is investigated. Using a Cr target and the same average target current, deposition rates are compared to dc magnetron sputtering (dcMS) rates. It is found that for a peak target current density ITpd of up to 570mAcm−2, HPPMS and dcMS deposition rates are equal. For ITpd>570mAcm−2, optical emission spectroscopy shows a pronounced increase of the Cr+∕Cr0 signal ratio. In addition, a loss of deposition rate, which is attributed to self-sputtering, is observed.

Material mixtures offer new possibilities for synthesizing coating materials with tailored optical and mechanical properties. We present experimental results on mixtures of HfO2, ZrO2, and Al2O3, pursuing applications in UV coating technology, while the mixtures are prepared by magnetron sputtering, ion beam sputtering, plasma ion-assisted deposition (PIAD), and electron beam evaporation without assistance. The properties investigated include the refractive index, optical gap, thermal shift, and mechanical stress. The first high reflectors for UV applications have been deposited by PIAD.

No abstract

No abstract

No abstract