A facile, rapid, and nondestructive technique for determining the thermal conductivity of individual nanowires based on Raman temperature mapping has been demonstrated. Using calculated absorption efficiencies, the thermal conductivities of single cantilevered Si nanowires grown by the vapor-liquid-solid method are measured and the results agree well with values predicted by diffuse phonon boundary scattering. As a measurement performed on the wire, thermal contact effects are avoided and ambient air convection is found to be negligible for the range of diameters measured. The method's versatility is further exemplified in the reverse measurement of a single nanowire absorption efficiency assuming diffuse phonon boundary scattering. The results presented here outline the broad utility that Raman thermography may have for future thermoelectric and photovoltaic characterization of nanostructures.

Bit Patterned Media (BPM) for magnetic recording provides a route to thermally stable data recording at >1 Tb/in 2 and circumvents many of the challenges associated with extending conventional granular media technology. Instead of recording a bit on an ensemble of random grains, BPM is comprised of a well ordered array of lithographically patterned isolated magnetic islands, each of which stores one bit. Fabrication of BPM is viewed as the greatest challenge for its commercialization. In this article we describe a BPM fabrication method which combines rotary-stage e-beam lithography, directed self-assembly of block copolymers, self-aligned double patterning, nanoimprint lithography, and ion milling to generate BPM based on CoCrPt alloy materials at densities up to 1.6 Td/in 2 (teradot/inch 2 ). This combination of novel fabrication technologies achieves feature sizes of <10 nm, which is significantly smaller than what conventional nanofabrication methods used in semiconductor manufacturing can achieve. In contrast to earlier work which used hexagonal closepacked arrays of round islands, our latest approach creates BPM with rectangular bitcells, which are advantageous for integration of BPM with existing hard disk drive technology. The advantages of rectangular bits are analyzed from a theoretical and modeling point of view, and system integration requirements such as provision of servo patterns, implementation of write synchronization, and providing for a stable head-disk interface are addressed in the context of experimental results. Optimization of magnetic alloy materials for thermal stability, writeability, and tight switching field distribution is discussed, and a new method for growing BPM islands from a specially patterned underlayer -referred to as "templated growth" -is presented. New recording results at 1.6 Td/in 2 (roughly equivalent to 1.3 Tb/in 2 ) demonstrate a raw error rate <10 -2 , which is consistent with the recording system requirements of modern hard drives. Extendibility of BPM to higher densities, and its eventual combination with energy assisted recording are explored.Index Terms-Bit patterned media, hard disk drive, block copolymer, self-assembly, double patterning, e-beam lithography, sequential infiltration synthesis, nanoimprint lithography, templated growth, thermal annealing, Co alloys, magnetic multilayers, interface anisotropy, magnetic recording, write synchronization, prepatterned servo, areal density.

Self-assembly is a powerful paradigm, wherein molecules spontaneously form ordered phases exhibiting well-defined nanoscale periodicity and shapes. However, the inherent energy-minimization aspect of self-assembly yields a very limited set of morphologies, such as lamellae or hexagonally packed cylinders. Here, we show how soft self-assembling materials—block copolymer thin films—can be manipulated to form a diverse library of previously unreported morphologies. In this iterative assembly process, each polymer layer acts as both a structural component of the final morphology and a template for directing the order of subsequent layers. Specifically, block copolymer films are immobilized on surfaces, and template successive layers through subtle surface topography. This strategy generates an enormous variety of three-dimensional morphologies that are absent in the native block copolymer phase diagram.

Optoelectrically functional 3D ZnO nanomeshes are synthesized via vapor-phase material infiltration into hierarchically self-assembled block copolymer thin films.

The ubiquitous presence of thermodynamically unfavored but kinetically trapped topological defects in nanopatterns formed via self-assembly of block copolymer thin films may prevent their use for many envisioned applications. Here, we demonstrate that lamellae patterns formed by symmetric polystyrene-block-poly(methyl methacrylate) diblock copolymers self-assemble and order extremely rapidly when the diblock copolymers are blended with low molecular weight homopolymers of the constituent blocks. Being in the "wet brush" regime, the homopolymers uniformly distribute within their respective self-assembled microdomains, preventing increases in domain widths. An order-of-magnitude increase in topological grain size in blends over the neat (unblended) diblock copolymer is achieved within minutes of thermal annealing as a result of the significantly higher power law exponent for ordering kinetics in the blends. Moreover, the blends are demonstrated to be capable of rapid and robust domain alignment within micrometer-scale trenches, in contrast to the corresponding neat diblock copolymer. These results can be attributed to the lowering of energy barriers associated with domain boundaries by bringing the system closer to an order-disorder transition through low molecular weight homopolymer blending.

Block copolymers self-assemble into a range of canonical morphologies. Here, we review a broad range of techniques for inducing these materials to form structures beyond the ‘native’ morphologies seen in the bulk equilibrium phase diagram. Methods that exploit intrinsic encoding (molecular design) and external enforcement (directed assembly) are compared.

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The spontaneous formation of periodic nanopatterns through the self-assembly of block copolymer (BCP) thin films offers an enticing path to engineer functional material properties over large areas, but the prohibitively slow ordering of ultrahigh molecular weight BCPs that generate large pattern periods (>100 nm) severely restricts the design space in which BCPs may be used. Here, we demonstrate that blending lamellaeforming polystyrene-block-poly(methyl methacrylate) diblock copolymers with very low molecular weight polystyrene and poly(methyl methacrylate) homopolymers can reduce by an orderof-magnitude the times required to form ordered large period patterns through solvent vapor annealing. Using in situ grazing-incidence small-angle X-ray scattering and ex situ electron microscopy, we show that the added homopolymer plasticizers act as a "smart solvent": They increase the mobility of the long BCP chains by amplifying the dilution effect during solvent vapor annealing but segregate to like domains during subsequent thermal annealing to produce high-quality patterns with periods that may exceed 200 nm, which are readily transferred to other materials. The dramatic impact of homopolymer plasticizers may help extend the use of BCPs into new areas, particularly for visible light photonic applications that demand larger period nanopatterns.