YAlO 3 films are grown on (100)SrTiO 3 substrates through an in-situ novel metal-organic (MO)CVD strategy involving a molten source consisting of the second-generation Y(hfa) 3 ·diglyme (Hhfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedione, diglyme = bis(2-methoxyethyl)ether) precursor which acts as a solvent for the Al(acac) 3 (Hacac = acetylacetone). The X-ray diffraction (XRD) patterns show that the films are crystalline and highly oriented, while compositional analysis indicates that the films possess the correct 1:1 ratio. Pole figures are applied as a simple, economic, non-invasive tool to assess the growth direction of YAlO 3 films.

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