In this letter, we report a method to fabricate nano-column arrays with different shapes and in-plane orientations by glancing angle deposition. By changing the rate of the rotation during each revolution, we can fabricate nano-columns with circular, elliptical, triangle, rectangular, and pentagon shapes. Depending on the nucleation sites, we can even fabricate flowerlike nano-columns. This method has potential application to produce 3-D lattice.

A novel etch front roughening phenomenon has been observed in the plasma etching of Si(100). The morphology exhibits a network structure with holes which coarsen with etech time, and a wavelength selection with a characteristic spatial frequency decreasing with time. The average local slope is invariant while the vertical roughness grows as w ϳ t b , with b 0.91 6 0.03. We suggest a nonlocal Langevin equation based on the redistribution of the reactant gas flux by local morphological features. Numerical calculations give results consistent with our experiments. [S0031-9007(99)

Nanometre-size cobalt columns with tilt angle ranging from ∼0º to ∼40º and fixed density on Si(100) were fabricated by combining oblique-angle physical evaporation with controlled substrate motion. The column tilt angle can be controlled by the speed and phase of substrate rotation in addition to the angle of the incident vapour beam. A simple geometrical model is proposed to describe the relationship between the tilt angle of the cobalt columns and the rotational parameters (speed and phase), and is consistent with our experimental results.

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