Thin films of polystyrene (PS) and poly(methyl methacrylate) (PMMA) were spun-cast onto silicon substrates, annealed, and analyzed by atomic force microscopy (AFM), total electron yield (TEY), and partial electron yield (PEY) near-edge X-ray absorption fine structure (NEXAFS) spectroscopy in order to resolve conflicting prior literature regarding the tendency of PS to form a wetting layer or overlayer on top of PMMA. From the comparison of the three methods of analysis and on the basis of the extraordinary surface sensitivity of PEY NEXAFS, we conclude that PS does not form an overlayer in samples with morphologies near thermodynamic equilibrium. The PS forms droplets of a large size range on top of a PMMA layer that wets the hydrophilic SiO x substrate. From our results, the maximum thickness of a continuous PS wetting layer would be about 0.25 nm. This is in contrast to recent experiments that imply an equivalent PS wetting layer of about 5−10 nm is forming during annealing.

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Scanning transmission X-ray microscopy (STXM) and atomic force microscopy have been used to study the morphology and chemical composition of macrophase-segregated block copolymers in plaque formulations based on water-blown flexible polyurethane foams. Although there has been a large body of indirect evidence indicating that the observed macrophase-segregated features in water-rich polyurethane foams are due principally to urea components, this work provides the first direct, spatially resolved spectroscopic proof to support this hypothesis. The STXM results are consistent with a segregation model where urea segments segregate, forming enriched phases with the majority of the polyetherpolyol and urethane groups at the chain ends of the urea hard segments. Chemical mapping of the urea, urethane, and polyether distribution about the urea-rich segregated phases showed that the urea concentration changes gradually (across several hundred nanometers) in a butylene oxide-based foam. This mapping also showed the urea-rich segregated phases present as a partial network in an ethylene oxide/propylene oxide sample.