Production rates of the compounds disulfur dedlwxide (S2F,3 and bis@entafimrosulfur) oxide (S20FI,) have been measmd following spark discharges m SF, as a hction of water content for vvater cmwmmbsm the range 600-3400 ppm (parts-per-million). Sparks were produced by capacitive discharge (80 J per spark) into SF, at a pressme of 100 kPa. Absolute yields were determined h m the spark energy h m direct measurement of the voltage and current waveforms In dry SF, the spark yield of S,F,, is 2.2 x IO-" mol +I. Addiag water to SF, results m a decrease m the yield of SP,, and an increase m the S20F,, yield Prodnaion of both w,, and &OF,, are believed to be formed via the precursor SF, lbkhamm. for production of these two disulfur compounds will be discussed Dlmlj4u Decqfluorrrie &F1J, a D ~ C O M ~ S Z ~ ~ O ~ h n z b e r o f Elecb?cal&S~essedSFe" In Vitro, 25(8), 673-675 (1989). [lo] Van Brunt, R J., O l d t o e J. IC., Firebaugh, S. L., and Sauas, I., "Mepnvemenr of Sple S,OF,,, a n d S @ p ~ ~ PraductIon h e s from S p k and Negatrve Glow Corona Ducharge m SFdo, Gas Mrrtwes,'~ The Eleventh htexnational Conference on Gas Discharges and Their Appiications, Tokyo, Japan, (1 995). [ 111 Sauers, L and Cacheiro, R A, "A Cpgenzc Enrichment Technque for Gpp Chromatogqhc Detect~on ofSzF;o m SF6 Discharges, " Conference