~ultichannel fast scanning diode array spectrometers represent a new class of spectroscopic tnstruments. They feature a unique combination of novel technologies, speed, comfort in handling, and ease of operation. In a research study the potentials of this powerful instrument in the field of m!croscope photometry are evaluated. As examples for possible applications the results of typIcal spectral measurements in absorption and reflection, including film-thickness determination of microstructured semiconductor layers, are presented.
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