Cd x Pb 1Ϫx S (0 р x р 1) thin films were prepared on glass substrates using the chemical bath deposition method. The structural, electrical, and photoelectrical properties of the films were investigated, and all were dependent on the x value. For x Ͼ 0.5 ͑high Cd content͒, the films show a poor crystallinity and weak photoconductivity. For x Ͻ 0.5 ͑high Pb content͒, the films exhibit a good crystallinity, with an average size of the crystallites of 100 nm, and good photoconductivity. The threshold voltage of photoconductivity is shifted to lower wavelengths with increasing Cd content. The experimental results point toward possible ternary deposition on some composition ranges ͑near pure PbS or CdS͒; whereas, for the rest, the deposited film is rather a mixture of phases ͓not Cd x Pb 1Ϫx S but (CdS) x (PbS) 1Ϫx ].

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Ge2Sb2Te5 (GST-225) is a chalcogenide material with applications in nonvolatile memories. However, chalcogenide material properties are dependent on the deposition technique. GST-225 thin films were prepared using three deposition methods: magnetron sputtering (MS), pulsed laser deposition (PLD) and a deposition technique that combines MS and PLD, namely MSPLD. In the MSPLD technique, the same bulk target is used for sputtering but also for PLD at the same time. The structural and optical properties of the as-deposited and annealed thin films were characterized by Rutherford backscattering spectrometry, X-ray reflectometry, X-ray diffraction, Raman spectroscopy and spectroscopic ellipsometry. MS has the advantage of easily leading to fully amorphous films and to a single crystalline phase after annealing. MS also produces the highest optical contrast between the as-deposited and annealed films. PLD leads to the best stoichiometric transfer, whereas the annealed MSPLD films have the highest mass density. All the as-deposited films obtained with the three methods have a similar optical bandgap of approximately 0.7 eV, which decreases after annealing, mostly in the case of the MS sample. This study reveals that the properties of GST-225 are significantly influenced by the deposition technique, and the proper method should be selected when targeting a specific application. In particular, for electrical and optical phase change memories, MS is the best suited deposition method.

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Cu2ZnSnS4 (CZTS) is an economically and environmentally friendly alternative to other toxic and expensive materials used for photovoltaics, however, the variation in the composition during synthesis is often followed by the occurrence of the secondary binary and ternary crystalline phases. These phases produce changes in the optical absorption edge important in cell efficiency. We explore here the secondary phases that emerge in a combinatorial Cu2S–ZnS–SnS2 thin films library. Thin films with a composition gradient were prepared by simultaneous magnetron sputtering from three binary chalcogenide targets (Cu2S, SnS2 and ZnS). Then, the samples were crystallized by sulfurization annealing at 450 °C under argon flow. Their composition was measured by energy dispersive X-ray spectroscopy (EDX), whereas the structural and optical properties were investigated by grazing incidence X-ray diffraction (GIXRD), Raman spectroscopy and optical transmission measurements. As already known, we found that annealing in a sulfur environment is beneficial, increasing the crystallinity of the samples. Raman spectroscopy revealed the presence of CZTS in all the samples from the library. Secondary crystalline phases such as SnS2, ZnS and Cu–S are also formed in the samples depending on their proximity to the binary chalcogenide targets. The formation of ZnS or Cu–S strongly correlates with the Zn/Sn and Cu/Zn ratio of the total sample composition. The presence of these phases produces a variation in the bandgap between 1.41 eV and 1.68 eV. This study reveals that as we go further away from CZTS in the composition space, in the quasi-ternary Cu2S–ZnS–SnS2 diagram, secondary crystalline phases arise and increase in number, whereas the bandgap takes values outside the optimum range for photovoltaic applications.

The topological transition from order to disorder in crystalline silicon was investigated by a computer simulation procedure. The gradually introduction of topological Wooten–Winer–Weaire defect states makes the crystal change in a more and more disordered assembly of atoms. The characterization of deformation energy around a single defect state is analyzed. The topological transition from graphene structure to an amorphous carbon layer, by introduction of a high number of Stone–Wales defect‐type states was evidenced. The comparison of the disordered structure in tetrahedrally bonded semiconductors (silicon) and a two‐dimensional network based on graphene structure was made.