Silicon carbide (SiC) films were deposited on stainless steel (SS), mild steel (MS) and aluminium (Al) from a SiC targeted in a magnetron sputtering system to produce the amorphous SiC coating. Magnetron sputtering is a Physical Vapor Deposition process for deposited material onto substrate by ejecting atom from such SiC and condensing the ejected atom onto SS, MS and Al metals in high vacuum environment. The behavior of the films as corrosion protection barriers in different concentrations of sodium chloride (NaCl) solution in 0.5 M and 1.0 M at different temperatures (30 o C and 50 o C) were evaluated by electrochemical impedance spectroscopy (EIS) measurements. Films on SS exhibited a better corrosion resistance than MS and Al. The weight loss measurement, it shows that uncoated metals loss more weight than coated metals for longer time of immersion. Meanwhile the EIS results also depicted that the polarization resistance, (R p) coated metals indicates higher value compared to uncoated metals. The water salinity and temperatures also showed a significant effect on polarization resistance, (R p ) for both coated and uncoated metals. The R p are decreased with the increased of salinity and temperature accordingly. X-ray diffraction (XRD) used for determination of phase identification. Based on XRD, there are no higher peaks were obtained on SiC, and showed that SiC were confirmed amorphous. It concluded that this study shows corrosion rate of coated metals was decreased obviously compared to uncoated metals and SiC nanocomposite coating performed a significant corrosion behaviors and resistance parameter on different metals.
Hydrophobic silica thin films were prepared by sol-gel processing and self-assembly by chemical vapor reaction with Trimethylchlorosilane (TMCS) at low temperature. The sols were divided into Sol A with ethanol, Polyethylene glycol (PEG) and water (H2O) while Sol B were contain precursor of silica Tetraethylorthosilicate (TEOS) hydrolyze with ethanol which was stirred for 15 minutes. HCl was added into the mixture and stirred for another 10 minutes. After deposition on 1 x 1 cm corning glass using spin coating technique (two-step timer), the films were heated at 60˚C for 10 minutes and finally annealed at 150°C for 1 hour. The films were characterized by using Rudolph/Auto EL Ellipsometer, Shimadzu Spectrophotometer, Perkin Elmer Fourier Transform Infrared (FTIR) and Atomic Force Microscope (AFM). The results showed that the films thickness and refractive index were in the range of 105.2 to 112.4 nm and 1.35 to 1.38, respectively. The films were transmitted 70-80% of light (in visible range) with various bondings of C-H, Si-O-Si, Si-C and Si-OH. Surface roughness of the films was increased from 30.6 nm (silica thin film) to 140.5 nm (hydrophobic silica thin films) after modification have been done on the films by using TMCS (heated at 40˚C). It was found that the water contact angles increased when time of reaction increased from 109° to 124°.
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