Three series of hyperbranched polycarbosiloxanes (HB-PCSOX)
and
polysiloxanes (HB-PSOX) were prepared from octafunctional polyhedral
oligomeric silsesquioxane (POSS) monomers and various difunctional
silanes by bimolecular nonlinear A8-B2 polymerization
(BMNLP) and characterized by IR, 1H NMR, 29Si
NMR, SEC, DSC, and for refractive index. Series 1 was prepared from
T8vinyl8 and disilane monomers, and series 2
was prepared from T8(OSiMe2H)8 and
divinylsilane monomers (where T denotes an SiO3 unit),
both via platinum-catalyzed hydrosilylation polymerization. Series
3 was prepared from T8(OSiMe2OH)8 and dichlorosilane monomers via hydrolysis–condensation polymerization.
Structure–property relationships were determined as methyl
vs phenyl content was varied. These HB POSS polymers were then functionalized
with curable alkoxysilane end groups and formulated with linear polysiloxanes
to fabricate transparent and robust nanostructured POSS-containing
coatings for use in a range of high-performance space and solar applications.
A positive-tone and aqueous-base-developable benzocyclobutene (BCB)-based dielectric material curable in air is described in this paper. The prepolymer is made from divinylsiloxane bisbenzocyclobutene (DVS-bisBCB) and BCB-acrylic acid. The formulation contains antioxidants that allow the prepolymer to cure in air and a diazonaphthaquinone to make it photosensitive. Patterned films have high resolution, and via openings are scum-free without a descum operation. Whether cured in nitrogen or in air, the prepolymer produces a film with optical, electrical, thermal, and mechanical properties desirable for many microelectronic applications, such as packaging applications and as a planarization or insulation layer in display applications.
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