Articles you may be interested inStructural anisotropic properties of a-plane GaN epilayers grown on r-plane sapphire by molecular beam epitaxy J. Appl. Phys. 115, 213506 (2014) We investigate the structural properties of a series of high alloy content InGaN epilayers grown by plasma-assisted molecular beam epitaxy, employing the deposition temperature as variable under invariant element fluxes. Using transmission electron microscopy methods, distinct strain relaxation modes were observed, depending on the indium content attained through temperature adjustment. At lower indium contents, strain relaxation by V-pit formation dominated, with concurrent formation of an indium-rich interfacial zone. With increasing indium content, this mechanism was gradually substituted by the introduction of a self-formed strained interfacial InGaN layer of lower indium content, as well as multiple intrinsic basal stacking faults and threading dislocations in the rest of the film. We show that this interfacial layer is not chemically abrupt and that major plastic strain relaxation through defect introduction commences upon reaching a critical indium concentration as a result of compositional pulling. Upon further increase of the indium content, this relaxation mode was again gradually succeeded by the increase in the density of misfit dislocations at the InGaN/GaN interface, leading eventually to the suppression of the strained InGaN layer and basal stacking faults. V C 2015 AIP Publishing LLC. [http://dx
The optical properties of thick InGaN epilayers, with compositions spanning the entire ternary range, are studied in detail. High structural quality, single phase InxGa1-xN (0001) films were grown heteroepitaxially by radio-frequency plasma assisted molecular-beam epitaxy on freestanding GaN substrates. Their emission characteristics were investigated by low temperature photoluminescence spectroscopy, whereas variable angle spectroscopic ellipsometry was applied to determine the complex dielectric function of the films, in the 0.55–4.0 eV photon range. Photoluminescence lines were intense and narrow, in the range of 100 meV for Ga-rich InGaN films (x < 0.3), around 150 meV for mid-range composition films (0.3 < x < 0.6), and in the range of 50 meV for In-rich alloys (x > 0.6). The composition dependence of the strain-free emission energy was expressed by a bowing parameter of b = 2.70 ± 0.12 eV. The films' optical dielectric function dispersion was obtained by the analysis of the ellipsometric data employing a Kramers-Kronig consistent parameterized optical model. The refractive index dispersion was obtained for alloys in the entire composition range, and the corresponding values at the band edge show a parabolic dependence on the InN mole fraction expressed by a bowing parameter of b = 0.81 ± 0.04. The bowing parameter describing the fundamental energy bandgap was deduced to be equal to 1.66 ± 0.07 eV, consistent with the ab initio calculations for statistically random (non-clustered) InGaN alloys.
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