Figure 1: a) The RBS spectrum of TiO 2 deposited on monocrystalline silicon. b) AES wide scan spectra of TiO 2 thin film surface on PTFE substrate. c) AES wide scan spectra of TiO 2 thin film surface on PTFE substrate after ion etch. d) AES in-depth profiling of TiO 2 thin film surface on nylon substrate. Observed thin film without any impurities e) AES wide scan spectra of Ag thin film indicator layer on nylon implant model coated by TiO 2 thin film. f) SEM image of titanium implant for particles precipitation analysis. Citation: Bogdanov E, Vavilina Y, Shusharina N, Goykhman A, Patrushev M (2014) The Particles Precipitation and Osseointegration of a Tio 2 Thin-Film Coating by Ion Beam Deposition -An In vivo Study.
The aim of the study is to develop an invasive device for long-term remote monitoring of cardiovascular system parameters, including blood pressure, in patients with comorbid conditions. Such a device is an important solution of a medical problemcontinuous monitoring of patients with hypertension, arrhythmias, chronic heart failure and other comorbid vascular conditions.We developed a pilot model of a device for longterm remote monitoring of blood pressure (systolic, diastolic, mean), heart rate and other calculable parameters of cardiovascular system. We developed a model of a capacitive sensor based on a microelectromechanical system technology (MEMS), equipped with a continuously-adjustable capacitor, wireless data communication and electric power supply. Transmitter model is developed. Engineering tests of device prototype were performed. Experimental work demonstrating the feasibility of converting the collected signals into mm of Hg for the measurement of blood pressure changes and steady radiosignal transduction to the transmitter was performed. A variant of biocompatible cover was chosen-silicone and parylene C. The sensor is designed to be implanted into human or animal body and can be situated either in the vessel lumen or on the vessel wall.
The Ion Beam Deposition (IBD) technique is not very widespread, but simple and very powerful methodic of thin film preparation, allowing to obtain high quality, smooth and very uniform films on big substrate areas (until 40 cm diameter), by target ablation with high energy particles in high vacuum. For the bombarding of the target is convenient to use the charged particles – ions of Ar, because they are easy to disperse in the electric field. Also, including neutralizing system, allow to obtain high-energy neutrals, irradiating the target, producing thin films from any kind of solid targets: from simple metals to complex conducting and non-conducting stoichiometric alloys. Thus, energy of condensing target particles is an average from several units to tens of eV. In the present contribution, we discuss the possibilities and advantages of IBD technology on application examples, including results of functional properties research of Ti, TiO2, SiO2 and Ag thin films for medicine applications, Ni, NiOx, Co and CoO single layers and structures for spintronics applications, and TiO2-SiO2, Ti-Zr-O-SiO2 multilayer structures for laser mirrors applications, produced by IBD system. Good structural, morphological quality (with roughness ~ 0.3 nm) and high uniformity on big areas along with right phase and stoichiometric state is demonstrated by convenient standard techniques for the structures prepared under the optimized growth conditions.
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