Deposition of semiconductors and metals from chemical precursors onto planar substrates is a well-developed science and technology for microelectronics. Optical fibers are an established platform for both communications technology and fundamental research in photonics. Here, we describe a hybrid technology that integrates key aspects of both engineering disciplines, demonstrating the fabrication of tubes, solid nanowires, coaxial heterojunctions, and longitudinally patterned structures composed of metals, single-crystal semiconductors, and polycrystalline elemental or compound semiconductors within microstructured silica optical fibers. Because the optical fibers are constructed and the functional materials are chemically deposited in distinct and independent steps, the full design flexibilities of both platforms can now be exploited simultaneously for fiber-integrated optoelectronic materials and devices.
Articles you may be interested inFiber optic light collection system for scanning-tunneling-microscope-induced light emission Rev. Sci. Instrum. 78, 053707 (2007); 10.1063/1.2740479Transient radiation responses of silica-based optical fibers: Influence of modified chemical-vapor deposition process parameters Amorphous silicon is deposited within optical fibers by a high pressure microfluidic deposition process and characterized via Raman spectroscopy. All-optical modulation of 1.55 m light guided through the silicon core is demonstrated using the free carrier absorption generated by a 532 nm pump pulse. Modulation depths of up to 8.26 dB and modulation frequencies of up to 1.4 MHz are demonstrated.
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