The appeal of ultra-compact spintronics drives intense research on magnetism in low-dimensional materials. Recent years have witnessed remarkable progress in engineering two-dimensional (2D) magnetism via defects, edges, adatoms, and magnetic proximity. However, intrinsic 2D ferromagnetism remained elusive until recent discovery of out-of-plane magneto-optical response in Cr-based layers, stimulating the search for 2D magnets with tunable and diverse properties. Here we employ a bottom-up approach to produce layered structures of silicene (a Si counterpart of graphene) functionalized by rare-earth atoms, ranging from the bulk down to one monolayer. We track the evolution from the antiferromagnetism of the bulk to intrinsic 2D in-plane ferromagnetism of ultrathin layers, with its characteristic dependence of the transition temperature on low magnetic fields. The emerging ferromagnetism manifests itself in the electron transport. The discovery of a class of robust 2D magnets, compatible with the mature Si technology, is instrumental for engineering new devices and understanding spin phenomena.
A class of intrinsic 2D ferromagnets – layered metalloxenes – is established by coupling graphene-like honeycomb networks of silicene and germanene with 2D lanthanide layers.
Coupling to Eu makes graphene magnetic without sacrificing its intrinsic properties.
Addition of magnetism to spectacular properties of graphene may lead to novel topological states and design of spin logic devices enjoying low power consumption. A significant progress is made in defect-induced magnetism in graphene-selective elimination of p orbitals (by vacancies or adatoms) at triangular sublattices tailors graphene magnetism. Proximity to a magnetic insulator is a less invasive way, which is being actively explored now. Integration of graphene with the ferromagnetic semiconductor EuO has much to offer, especially in terms of proximity-induced spin-orbit interactions. Here, we synthesize films of EuO on graphene using reactive molecular beam epitaxy. Their quality is attested by electron and X-ray diffraction, cross-sectional electron microscopy, and Raman and magnetization measurements. Studies of electron transport reveal a magnetic transition at T ≈ 220 K, well above the Curie temperature 69 K of EuO. Up to T, the dependence R ( B) is strongly nonlinear, suggesting the presence of the anomalous Hall effect. The role of synthesis conditions is highlighted by studies of an overdoped structure. The results justify the use of the EuO/graphene system in spintronics.
Silicene, a Si analogue of graphene, is suggested to become a versatile material for nanoelectronics. Being coupled with magnetism, it is predicted to be particularly suitable for spintronic applications. However, experimental realization of free-standing silicene and its magnetic derivatives is lacking. Fortunately, magnetism can be induced into silicene layers, in particular, by intercalation. Here, a successful synthesis of multilayer silicene intercalated by inherently magnetic Eu ions -a compound expected to exhibit both massless Dirac-cone states, as its Ca analogue, and a nontrivial magnetic structure -is reported. This new polymorph with EuSi 2 stoichiometry is epitaxially stabilized by continual replication of silicene layers employing Sr-intercalated multilayer silicene as a template. The atomic structure of the new compound and its sharp interface with the template are confirmed using electron diffraction, X-ray diffraction, and electron microscopy techniques. Below 80 K, the material demonstrates anisotropic antiferromagnetism coexisting with weak ferromagnetism. The magnetic state is accompanied by an anomalous behavior of magnetoresistivity.
Silicene, a 2D honeycomb lattice of Si atoms similar to graphene, is expected to be a platform for nanoelectronics and home to novel quantum phenomena. Unlike graphene, free-standing silicene is notoriously difficult to stabilize, while strong hybridization of silicene with substrates destroys its desirable properties. On the other hand, Dirac cones of silicene are effectively realized in a bulk - stoichiometric ionic multilayer silicene intercalation compound CaSi2. Besides, a number of new 2D silicene-based materials are synthesized employing CaSi2 as a precursor. However, the rather complex atomic structure of CaSi2 and fresh opportunities of physical and chemical breakthroughs drive the search for alternative compounds with silicene networks. Here, a new polymorph of SrSi2 is synthesized, enjoying both the structure of intercalated multilayer silicene and the simplest possible stacking of silicene sheets. The MBE-quality synthesis accomplished on Si(001) and Si(111) surfaces leads to epitaxial films of SrSi2 with orientation controlled by the substrate, as revealed by XRD, RHEED and electron microscopy studies. The structural SrSi2/Si relation is mirrored in the transport properties of the films.
Materials in which charge and spin degrees of freedom interact strongly offer applications known as spintronics. Following a remarkable success of metallic spintronics based on the giant-magnetoresistive effect, tremendous efforts have been invested into the less developed semiconductor spintronics, in particular, with the aim to produce three-terminal spintronic devices, e.g. spin transistors. One of the most important prerequisites for such a technology is an effective injection of spin-polarized carriers from a ferromagnetic semiconductor into a nonmagnetic semiconductor, preferably one of those currently used for industrial applications such as Si -a workhorse of modern electronics. Ferromagnetic semiconductor EuO is long believed to be the best candidate for integration of magnetic semiconductor with Si. Although EuO proved to offer optimal conditions for effective spin injection into silicon and in spite of considerable efforts, the direct epitaxial stabilization of stoichiometric EuO thin films on Si without any buffer layer has not been demonstrated to date. Here we report a new technique for control of EuO/Si interface on submonolayer level which may have general implications for the growth of functional oxides on Si. Using this technique we solve a long-standing problem of direct epitaxial growth on silicon of thin EuO films which exhibit structural and magnetic properties of EuO bulk material. This result opens up new possibilities in developing all-semiconductor spintronic devices.Modern information technology is based on the fundamental dichotomy: it utilizes charge of electrons to process information in semiconductors and their spin to store information in magnetic materials. Strong correlation of spin and charge degrees of freedom in the same material makes it possible to manipulate magnetically stored information with electric fields and/or modify fast logic gates by changing the magnetisation of their components. In metal multilayers, such effects are manifest in giant magnetoresistance, where the orientations of the macroscopic magnetisation in adjacent layers determine the electrical resistance of the structure [1,2]. Metallic spintronic devices, such as hard disk read heads and magnetic random access memory are among the most successful technologies of the past decades. However, metals cannot enhance signals -the prerequisite for transistor technology readily offered by semiconductors.The development of semiconductor spintronics requires the ability to inject, modulate and detect spin-polarized carriers in a single device, preferably made of technologically important materials currently used in integrated circuits such as Si or GaAs [3,4]. Thus far, the spin of the carriers has played a minor role in semiconductor devices mainly because Si and GaAs are nonmagnetic. On the other hand, the enhanced spin-related phenomena realized in diluted magnetic semiconductors (DMS) (especially 2 GaMnAs films [5]) open the way for applications in spintronics [6]. The interplay between electrical and magneti...
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