Aluminum nitride (AlN) thin films deposited by reactive radio frequency magnetron sputtering in an Ar/N2 discharge on Si(001) substrates were studied with respect to structure, stress, and piezoelectric properties. In order to optimize the AlN layers for flexural plate wave (FPW) devices, the influence of process pressure and N2 concentration has been evaluated by means of spectroscopic ellipsometry, residual stress measurements, x-ray diffraction, atomic and piezoresponse force microscopy, along with analysis of the piezoelectric charge coefficient d33,f. FPW devices with low compressively stressed (−200 to −300 MPa) AlN layers were prepared and characterized by white light interferometry and Raman measurements. With increasing pressure from 3×10−3 to 8×10−3 mbar, a transition from −840 MPa compressive stress to +300 MPa tensile stress was measured. Increasing the nitrogen concentration from 3.3% to 50% resulted in a change in stress from +150 to −1170 MPa. All films exhibited a high degree of c-axis orientation. A piezoelectric charge coefficient up to d33,f≈−6.8 pC/N was obtained. Furthermore, it is shown that the film surface morphology is also very much dependent on the growth conditions. A model regarding the mean free path of the sputtered particles and the film surface morphology is proposed. The authors show that the optimization of the film stress by means of the nitrogen concentration in the sputter gas mixture is beneficial as the process window is larger

A great potential of the use of aluminum nitride (AlN) to enhance the actuation of nanocrystalline diamond (NCD) microelectromechanical system disk resonators is revealed. A disk resonator with a unimorph (AlN/NCD) structure is fabricated by depositing a c-axis oriented AlN on a capacitive NCD disk resonator. The unimorph resonator is piezoelectrically actuated with flexural whispering gallery modes with a relatively large electrode gap spacing, i. e., the spacing which is greater than 1 mu m, although this is not possible for the capacitive NCD disk resonator. This result is explained by a finite element method simulation where the piezoelectric actuation turns out to be more effective than the capacitive actuation when the electrode gap spacing is > 0.8 mu m. The simulation also shows that the electrode gap spacing required for the capacitive actuation to be more effective than the piezoelectric actuation exponentially decreases when the resonator dimension is scaled down for higher frequency operations. Our study indicates that the use of AlN is promising to decrease impedance levels of NCD disk resonators especially for their higher frequency operations

Micro electromechanical systems are a matter of intense research pursuing to replace silicon and III–V semiconductor-based components in prospective radio frequency communication devices. Due to their unique material properties, microstructures combining doped nano-crystalline diamond (NCD) and AlN thin films are promising for piezo-actuated microsystems in order to increase operating frequencies. In this work, single and doubly clamped unimorph NCD-on-AlN micro-resonators were fabricated and then characterized by laser vibrometry towards their flexural resonant frequencies in the range of 0.1–20 MHz to deduce their mechanical properties. Enhancements in the structural properties of an AlN piezo-actuator united with an advanced elasticity of nano-diamond electrode lead to superior mechanical parameters of the resulting unimorphs. These allow for the fabrication of flexural resonant microsystems with a potential to extend the operating frequencies well above 1 GHz.

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