The reactions of bridged tris(trimethylsilyl)silyl fragments with 2 molar equiv of potassium tert-butoxide allow the generation of R,ω-oligosilyl dianions (1a, 2a, 3a, 4a). Depending on the nature of the spacer between the oligosilyl units, these compounds can be used to generate either linear or cyclic derivatives. They are especially attractive for the formation of homoand heterocyclosilanes, as exemplified by the synthesis of sila-, stanna-, and zirconocenacyclosilanes. A linear bis(potassiumsilyl)acetylene (4a) was used to bridge two zirconocene units, (Cp 2 Zr(Cl)Si(SiMe 3 ) 2 CCSi(SiMe 3 ) 2 Zr(Cl)Cp 2 ) (11).
Some newly synthesized di-, tri-, penta-, and hexasilanes bearing trimethylsilyl groups together with some previously reported related compounds were analyzed using single-crystal X-ray crystallography. The structure analyses were compared to similar compounds already known. The influence of bulky tris(silyl)silyl groups on the Si-Si skeleton was studied.
Hafnium tetrachloride reacts with the tris(trimethylsilyl)silyl potassium tmen adduct (1) to form a [tris(trimethylsilyl)silyl]trichlorohafnium tmen complex (2); reaction of 2 with 2,6-dimethylphenylisonitrile leads to insertion into the silicon hafnium bond (4).
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