Gratings produced by two-spherical-beam Laser Interference Lithography (LIL) will have a nonuniform period, and the associated period variation is larger with the increase of the substrate size. This work quantitatively investigates a noninvasive method for improving the period variation on 4-inch silicon wafers. By temporarily deforming the flexible silicon wafer using a customized concave vacuum chuck [J. Vac. Sci. Technol. B 19(6), 2347 (2001)10.1116/1.1421558], we show that the fabricated gratings will have improved period uniformity, with the period variation reduced by 86% at the 1000 nm central grating period setting. This process is a simple and efficient way to achieve linear gratings without altering the LIL configuration with two spherical beams. We present experimental results on the impact of a concave vacuum chuck on the chirp reduction at different grating period settings. Then, we compare two different LIL configurations with different wavelength sources concerning their influence on the efficiency of period variation reduction. Finally, the flatness of the 4-inch silicon wafers due to the temporary bending process is verified using optical profilometry measurements.
We present the intracavity generation of beams with radial polarization at an average output power of 750 W and an optical efficiency of 43% from a continuous wave thin-disk laser. Circular grating waveguide output couplers (GWOC) were used to select the radial polarization. The sensitivity of the polarizing function of the GWOC with regards to the fabrication tolerances is also analysed in details with a particular emphasis on the effect of the duty cycle and the geometrical profile of the gratings. Furthermore, we present the conversion of femtosecond laser pulses from linear to azimuthal polarization using a nanograting-based polarization converter. Azimuthally polarized beams with an average power of up to 850 W, a pulse duration of 400 fs and a pulse repetition rate of 1 MHz were generated in this way with a conversion efficiency of >90%.
This paper reports the fabrication and first demonstration of all-dielectric crystalline grating–waveguide reflectors comprising a Sc2O3 waveguide grown on a sub-wavelength-patterned sapphire substrate. Rigorous coupled-wave analysis is employed to simulate the operation of the structure, suggesting a 100% resonance reflectivity in theory. Structuring of the sapphire substrate is achieved using inductively coupled plasma etching, whilst pulsed laser deposition is used for epitaxial growth of the Sc2O3 crystalline waveguide. Devices with distinct TE- and TM-polarisation resonances around 1030-nm for an angle of incidence near 10° are demonstrated, with reflectance approaching 90%. The discrepancy in reflectivity is attributed to the waveguide thickness variation and surface roughness. Refinement of the fabrication processes and tolerances should lead to improvement in the surface quality of the crystalline grating–waveguide structure and operation closer to the ideal resonance reflectivity.
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