Articles you may be interested inMagnetic permeability of Si-rich (FeCoNi)-based nanocrystalline alloy: Thermal stability in a wide temperature range J. Appl. Phys. 113, 17A310 (2013); 10.1063/1.4794718Self-assembly of multiwalled carbon nanotubes from quench-condensed CNi 3 films Structure of electroless deposited Co 0.9 W 0.02 P 0.08 thin films and their evolution with thermal annealing Thin nanocrystalline hcp Co-based films are grown by chemical vapor deposition on SiO 2 . Tetrakis͑trimethylphosphine͒cobalt͑0͒, ͑͑CH 3 ͒ 3 P͒ 4 Co, is a single-source precursor that forms Co films that incorporate both P and C when the substrate temperature ranges from 225 to 325°C, and feature crystallites sized Ͻ15 nm. The P within the deposited film is mostly elemental with some being phosphidic, and the C exists mostly in the carbidic form along with some being graphitic. The Co is correspondingly predominantly metallic. Upon annealing to 400°C for 3 h, some extent of both Co 2 P crystallite precipitation and minimal allotropic transformation to fcc Co is observed, and the amount of carbidic C is reduced relative to graphitic C, but the nanocrystalline microstructure of the film is preserved, still primarily composed of hcp Co-based crystallites.
First-principles density-functional calculations are presented revealing that Ru(P) and Ru(B) alloys with moderate P or B content can result in a glassy structure exhibiting strong chemical short-to-medium range order. Amorphous phases are predicted to be energetically more favorable than the crystalline counterparts for the Ru(P) and Ru(B) alloys above ~20 at.% P and ~10 at.% B. The relative stability of amorphous and crystalline Ru(B) alloys is examined along with local atomic ordering in the amorphous alloys. The growth of ultrathin (3nm) amorphous Ru(B) alloy films of varying B concentration via chemical vapor deposition is explored using Ru 3 (CO) 12 and B 2 H 6 as the Ru and B sources, respectively. Experiments reveal the films grown at 250 C are amorphous at B contents in excess of 15 at.% and polycrystalline below 10 at.% B, consistent with first-principles predictions. Amorphous Ru(B) films remain amorphous following annealing at 450 °C and become polycrystalline at 500 °C. Film resistivity ranged from 40 to 120 μΩ-cm and was independent of B loading. Electric field stress tests to failure for Cu/3-nm Ru(B)/SiO 2 /Si stacks are used to indicate suitability of Ru(B) as a copper diffusion barrier layer.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.