The fabrication and characterization of an optically addressable deformable mirror for a spatial light modulator is described. Device operation utilizes an electrostatically driven pixellated aluminized polymeric membrane mirror supported above an optically controlled photoconductive GaAs substrate. A 5 microm thick grid of patterned photoresist supports the 2 microm thick aluminized Mylar membrane. A conductive ZnO layer is placed on the back side of the GaAs wafer. A standard Michelson interferometer is used to measure mirror deformation data as a function of illumination, applied voltage, and frequency. A simplified analysis of device operation is also presented.
The fabrication and characterization of an optically addressable deformable mirror for a spatial light modulator are described. Device operation utilizes an electrostatically driven pixelated aluminized polymeric membrane mirror supported above an optically controlled photoconductive GaAs substrate. A 5 mum thick grid of patterned photoresist supports the 2 mum thick aluminized Mylar membrane. A conductive ZnO layer is placed on the backside of the GaAs wafer. Similar devices were also fabricated with InP. A standard Michelson interferometer is used to measure mirror deformation data as a function of illumination, applied voltage, and frequency. The device operates as an impedance distribution between two cascaded impedances of deformable membrane substrate, substrate, and electrode. An analysis of device's operation under several bias conditions, which relates membrane deformation to operating parameters, is presented.
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