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With the energy resolved quadrupole mass spectrometer and hybrid simulation, the influence of low-frequency (LF) source parameters on the ion energy distributions (IEDs) of argon ions impinging on the grounded electrode was studied, both experimentally and numerically, in a dual frequency capacitively coupled plasma. It was shown that for decreasing LF or increasing LF power, the high energy peak in IEDs shifts toward the high energy region significantly. The simulation results were in general agreement with the experimental data.

A facile and fast CVD method for the deposition of TiO 2 films, under atmospheric pressure and at room temperature, onto glass and polyethylene terephthalate (PET) substrates is explored. The hydrolysis reaction of titanium tetraisopropoxide (TTIP) is employed for the deposition of TiO 2 film, and the corresponding deposition rate determined. The surface morphology of the as-deposited TiO 2 films is observed by scanning electron microscopy (SEM) and atomic force microscopy (AFM). In order to confirm the structure, composition, and optical properties of the films, X-ray diffraction (XRD), Raman spectroscopy (RS), Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and UV-Vis absorption spectroscopy are employed. The as-deposited TiO 2 films are amorphous with a band gap energy of around 3.42 eV and rich in surface OH groups, which exhibit very high photocatalytic activity for complete oxidation of HCHO in simulated air under UV-C irradiation.

TiO 2 film is deposited by atmospheric-pressure (AP), radio-frequency (RF), dielectric barrier discharge (DBD) plasma at a low power using titanium tetraisopropoxide (TTIP) and O 2 as the precursors. The morphology, optical properties, and crystalline structure of the as-deposited TiO 2 film are investigated by using scanning electron microscopy (SEM), atomic force microscopy (AFM), ultraviolet-visible (UV-vis) absorption spectroscopy, and Raman spectroscopy. The as-deposited TiO 2 film show high photocatalytic activity in complete oxidation of HCHO to CO 2 and degradation of stearic acid. The gas temperature in the RF-DBD plasma is estimated to be at about 500 K by the rotational temperature via optical emission spectroscopy (OES). The experimental results of amorphous TiO 2 film treated by the RF-DBD plasma further exclude the likelihood of thermal effects derived from the plasma on crystallization of TiO 2 film. It is confirmed that the non-thermal effect of the RF-DBD plasma on the high photocatalytic activity of the as-deposited TiO 2 film does exist.