-WO3/Ag/WO3 multilayer was researched by using RF magnetron sputtering with transparent electrode. Process gas flow ratio with Ar/O2 were selected the optimum conditions at 70sccm/2sccm and WO3 thin film at its conditions was appeared at transmittance about 80% in the visible light region to the average. WO3/Ag/WO3 multilayer thin films were fabricated from the same process condition which was the same gas flow ratio of Ar and O2 WO3/Ag/WO3 thin films were appeared transmittance about 93% and sheet resistance about 6.41Ω/□. From the SEM images, each thin films were appeared when WO3 is 40nm and O2 is 10nm.
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