Nanoimprint lithography is used to fabricate 200nm–10μm wide SU-8 channels reversal imprinted onto Si substrates. The immobilization and stretching of double stranded λ-DNA molecules within the micro- and nanochannels are demonstrated and controlled by varying the hydrophobicity of SU-8 using oxygen plasma exposure. Site-directed immobilization of DNA is achieved by the integration of 10μm wide SU-8 patterns with 6μm gaps into 100μm wide and 1μm deep Si channels.
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