The rod-pinch diode consists of an annular cathode and a small-diameter anode rod that extends through the hole in the cathode. With high-atomic-number material at the tip of the anode rod, the diode provides a small-area, high-yield x-ray source for pulsed radiography. The diode is operated in positive polarity at peak voltages of 1 to 2 MV with peak total electrical currents of 30–70 kA. Anode rod diameters as small as 0.5 mm are used. When electrode plasma motion is properly included, analysis shows that the diode impedance is determined by space-charge-limited current scaling at low voltage and self-magnetically limited critical current scaling at high voltage. As the current approaches the critical current, the electron beam pinches. When anode plasma forms and ions are produced, a strong pinch occurs at the tip of the rod with current densities exceeding 106 A/cm2. Under these conditions, pinch propagation speeds as high as 0.8 cm/ns are observed along a rod extending well beyond the cathode. Even faster pinch propagation is observed when the rod is replaced with a hollow tube whose wall thickness is much less than an electron range, although the propagation mechanism may be different. The diode displays well-behaved electrical characteristics for aspect ratios of cathode to anode radii that are less than 16. New physics understanding and important properties of the rod-pinch diode are described, and a theoretical diode current model is developed and shown to agree with the experimental results. Results from numerical simulations are consistent with this understanding and support the important role that ions play. In particular, it is shown that, as the ratio of the cathode radius to the anode radius increases, both the Langmuir–Blodgett space-charge-limited current and the magnetically limited critical current increase above previously predicted values.
This paper presents data and analyses from which emerges a physical picture of microsecond-conduction-time plasma opening switch operation. During conduction, a broad current channel penetrates axially through the plasma, moving it toward the load. Opening occurs when the current channel reaches the load end of the plasma, far from the load. During conduction, the axial line density in the interelectrode region is reduced from its value with no current conduction as a result of radial hydrodynamic forces associated with the current channel. A factor of 20 reduction is observed at opening in a small, localized region between the electrodes. When open, the switch plasma behaves like a section of magnetically insulated transmission line with an effective gap of 2 to 3 mm. Increasing the magnetic field in this gap by 50% results in an improvement of 50% in the peak load voltage and load current rise time, to 1.2 MV and 20 nsec, respectively. An erosion opening mechanism explains the inferred gap growth rate using the reduced line density at opening. Improved switch performance results when the maximum gap size is increased by using a rising load impedance.
Organic thin films were deposited by plasma-enhanced chemical vapor deposition, using isopropyl alcohol
as a precursor. The pulsed, inductively coupled plasma was characterized with in situ Langmuir probe
measurements and mass spectrometry. We identify the key ionized species diffusing to the substrate and
offer explanations as to how they are generated. The films were analyzed with X-ray photoelectron
spectroscopy. Correlations were observed between the plasma ion mass distributions and the oxidation
state of the deposited carbon.
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