Residual absorption in optical coatings and materials is directly measured by means of the laser-induced deflection (LID) technique. For transmissive coatings a measurement strategy is introduced that allows for the separation of different absorptions of the investigated sample (bulk, coating, surface) by use of only one sample. Laser irradiation yields absorption values between 2 x 10(-3) and 2.9 x 10(-2) for antireflecting and highly reflecting (HR) coatings at 193 nm and 30.6 x 10(-6) for a HR mirror at 527 nm. Use of laser-induced fluorescence at 193 nm excitation reveals trivalent cerium and prasodymium and hydrocarbons in different single layers and coatings. In addition to correlation with absorption data, the influence of a high fluorescence quantum yield on the absorption measurement is discussed.

Using experimental results and numerical simulations, two measuring concepts of the laser induced deflection (LID) technique are introduced and optimized for absolute thin film absorption measurements from deep ultraviolet to IR wavelengths. For transparent optical coatings, a particular probe beam deflection direction allows the absorption measurement with virtually no influence of the substrate absorption, yielding improved accuracy compared to the common techniques of separating bulk and coating absorption. For high-reflection coatings, where substrate absorption contributions are negligible, a different probe beam deflection is chosen to achieve a better signal-to-noise ratio. Various experimental results for the two different measurement concepts are presented.

Single layer antireflection coatings (SLAR) consisting of nanoporous silica (NP SiO 2 ) films are developed by selective chemical etching of atomic layer deposited (ALD) Al 2 O 3 :SiO 2 composite films. The reflective index of the final NP SiO 2 film is finely adjusted from 1.132 to 1.400 at 600 nm wavelength by applying an appropriate ratio in the composite. To meet the requirements of the SLAR coatings from the deep UV (DUV) to the near IR (NIR) spectral range, the film thickness is controlled with nanometer precision by the ALD process. The SLAR are simultaneously applied on both sides of flat or highly curved substrates. Transmittance values above 99.4% are achieved even at a wavelength of 193 nm on fused silica substrates. Various characterization methods demonstrate the advantages of these SLAR with regard to impurities, optical losses, laser induced damage threshold (LIDT) properties, and surface super-hydrophilicity. The absorption losses at 193 nm wavelength as determined by laser induced deflection measurements amount to approximately 200 ppm, and to approximately 2 ppm at a wavelength of 1064 nm, while the scattering losses are around 30 ppm at 532 nm wavelength for quarter-wave layers. The LIDT values at 1064 nm are in the range of 93 J cm À2 being close to the values measured on the uncoated substrate.

Absolute measurement of residual absorption in optical coatings is steadily becoming more important in thin film characterization, in particular with respect to high power laser applications. A summary is given on the current ability of the laser induced deflection (LID) technique to serve sensitive photo-thermal absorption measurements combined with reliable absolute calibration based on an electrical heater approach. To account for different measurement requirements, several concepts have been derived to accordingly adapt the original LID concept. Experimental results are presented for prominent UV and deep UV laser wavelengths, covering a variety of factors that critically can influence the absorption properties in optical coatings e.g., deposition process, defects and impurities, intense laser irradiation and surface/interface engineering. The experimental findings demonstrate that by combining high sensitivity with absolute calibration, photo-thermal absorption measurements are able to be a valuable supplement for the characterization of optical thin films and coatings.

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