Growing large, oriented grains of perovskite often leads to efficient devices, but it is unclear if properties of the grains are responsible for the efficiency. Domains observed in SEM are commonly misidentified with crystallographic grains, but SEM images do not provide diffraction information. We study methylammoinium lead iodide (MAPbI3) films fabricated via flash infrared annealing (FIRA) and the conventional antisolvent (AS) method by measuring grain size and orientation using electron back-scattered diffraction (EBSD) and studying how these affect optoelectronic properties such as local photoluminescence (PL), charge carrier lifetimes, and mobilities. We observe a local enhancement and shift of the PL emission at different regions of the FIRA clusters, but we observe no effect of crystal orientation on the optoelectronic properties. Additionally, despite substantial differences in grain size between the two systems, we find similar optoelectronic properties. These findings show that optoelectronic quality is not necessarily related to the orientation and size of crystalline domains.

Localizing light to nanoscale volumes through nanoscale resonators that are low loss and precisely tailored in spectrum to properties of matter is crucial for classical and quantum light sources, cavity QED, molecular spectroscopy, and many other applications. To date, two opposite strategies have been identified: to use either plasmonics with deep subwavelength confinement yet high loss and very poor spectral control or instead microcavities with exquisite quality factors yet poor confinement. In this work we realize hybrid plasmonic–photonic resonators that enhance the emission of single quantum dots, profiting from both plasmonic confinement and microcavity quality factors. Our experiments directly demonstrate how cavity and antenna jointly realize large cooperative Purcell enhancements through interferences. These can be controlled to engineer arbitrary Fano lineshapes in the local density of optical states.

A general, one-step patterning technique for colloidal quantum dots by direct optical or e-beam lithography. Photons (5.5–91.9 eV) and electrons (3 eV–50 kV) crosslink and immobilize QDs down to tens of nm while preserving the luminescent properties.