An x-ray beam with energy of 20.5keV has been efficiently focused down to a spot size as small as 90nm×90nm by a Kirkpatrick–Baez reflecting mirrors device. The first mirror, coated with a graded multilayer, plays both the role of vertical focusing device and monochromator, resulting in a very high flux (2×1011photons∕s) and medium monochromaticity (ΔE∕E∼10−2). Evaluation of the error contributions shows that the vertical focus is presently limited by the mirror figure errors, while the horizontal focus is limited by the horizontal extension of the x-ray source. With a gain in excess of a few million, this device opens up new possibilities in trace element nanoanalysis and fast projection microscopy.
We have developed a design method to produce laterally graded multilayer x-ray mirrors based on sputter deposition techniques. The optimization of all relevant parameters yields an ab initio estimation of any layer gradient suitable to achieve precise x-ray focusing devices. The performance and the accuracy of this method are demonstrated. A graded W/B4C multilayer was deposited on a flat substrate that was bent to a parabola. The obtained nonlinear lateral gradient differed from the theoretical calculations by less than 1%. Focusing experiments performed at an x-ray energy of 8 keV on the ESRF optics beamline revealed an excellent performance with a focal spot size of about 7 μm.
Platinum films in the thickness range 20-500 Å have been sputtered onto sapphire substrates at different substrate temperatures . The structural properties of these films have been studied by high-resolution x-ray scattering techniques. Information about the total thickness of the film and about the surface and interface roughnesses has been determined by means of x-ray specular reflectivity measurements. The films sputtered at have shown Laue oscillations about the Pt(111) Bragg peak. The average thickness of coherently stacked lattice planes has been compared with the total film thickness , obtained from the reflectivity measurements. The epitaxial relationship between the platinum film and the sapphire substrate has been determined using in-plane x-ray diffraction. It was demonstrated that Pt epitaxial films include two in-plane orientations related by a rotation. Both anisotropic compression in the direction and anisotropic expansion in the [111] direction were observed for these films. A correlated variation of some structural parameters with the substrate temperature was found.
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