Stannous selenide is a layered semiconductor that is a polar analogue of black phosphorus, and of great interest as a thermoelectric material. Unusually, hole doped SnSe supports a large Seebeck coefficient at high conductivity, which has not been explained to date. Angle resolved photo-emission spectroscopy, optical reflection spectroscopy and magnetotransport measurements reveal a multiplevalley valence band structure and a quasi two-dimensional dispersion, realizing a Hicks-Dresselhaus thermoelectric contributing to the high Seebeck coefficient at high carrier density. We further demonstrate that the hole accumulation layer in exfoliated SnSe transistors exhibits a field effect mobility of up to 250 cm 2 /Vs at T = 1.3 K. SnSe is thus found to be a high quality, quasi twodimensional semiconductor ideal for thermoelectric applications. arXiv:1802.08069v1 [cond-mat.mtrl-sci]
Both direct and indirect transitions of photoluminescence and electroluminescence are observed in a Ge n+p diode. The relative intensity of direct radiative recombination with respect to indirect radiative recombination increases with the increase in the optical pumping power, injection current density, and temperature. The increase in electron population in the direct valley is responsible for the enhancement. The spectra can be fitted by the combination of direct and indirect transition models. The direct radiative transition rate is ∼1600 times of the indirect transition, estimated by electroluminescence and photoluminescence spectra near room temperature.
The influences of defects and surface roughness on the indirect bandgap radiative transition of Ge were studied. Bulk Ge has 15 times the integrated intensity of photoluminescence of Ge-on-Si. However, for Ge-on-Si sample, the direct transition related photoluminescence intensity is higher than the indirect transition related one. We affirm that the defects in the Ge-on-Si are responsible for the weak indirect transition and relatively strong direct transition. The scattering of electrons by roughness at Ge/oxide interface can provide extra momentum of the indirect band transition of Ge, and thus enhance the indirect radiative transition.
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