A promising optical memory device called digital thin-film (DTF) color optical memory is presented. The DTF optical memory utilizes localized regions of varying thickness to adjust the spectral characteristic of reflected light from a broad band source. The DTF structure has been fabricated by Ga+ focused ion beam milling on thermally grown silicon dioxide on Si to prove the concept. A charge-coupled device array is used as the optical detector for the readout of the stored data. The reflected light image of the DTF memory reveals easily discriminated color levels and proves the suitability of using optical means to extract the stored data. DTF optical memory structures with 16 physical levels or 4 bits/pixel have been fabricated providing an equivalent storage density in excess of 5 Gb/in.2
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