We have studied the roughness and the dynamics of the contact line of a viscous liquid on a disordered substrate. We have used photolithographic techniques to obtain a controlled disorder with a correlation length xi = 10microm. Liquids with different viscosity were used: water and aqueous glycerol solution. We have found that the roughness W of the contact line depends neither on the viscosity nor on the velocity v of the contact line for v in the range 0.2-20microm/s. W is found to scale with the length L of the line as L(zeta) with a roughness exponent zeta = 0.51+/-0.03. This value is similar to the one obtained with superfluid helium. In the present experiment, we have checked that the motion of the contact line is actually overdamped, so that the phenomenological equation first proposed by Ertas and Kardar should be relevant. However, our measurement of zeta is in disagreement with the predicted value zeta = 0.39. We have also analyzed the avalanche-like motion of the contact line. We find that the size distribution does not follow a power law dependence.
We have measured the contact angle of a liquid helium-4 meniscus on a cesium substrate as a function of the velocity of the three phase contact line, at various temperatures. The velocity is found to vary exponentially with the applied force. We show that the contact line advances through thermally activated jumps. Their area of about 125 nm 2 is probably related to the roughness of the cesium substrate which is evaporated at low temperature.
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