-WO3/Ag/WO3 multilayer was researched by using RF magnetron sputtering with transparent electrode. Process gas flow ratio with Ar/O2 were selected the optimum conditions at 70sccm/2sccm and WO3 thin film at its conditions was appeared at transmittance about 80% in the visible light region to the average. WO3/Ag/WO3 multilayer thin films were fabricated from the same process condition which was the same gas flow ratio of Ar and O2 WO3/Ag/WO3 thin films were appeared transmittance about 93% and sheet resistance about 6.41Ω/□. From the SEM images, each thin films were appeared when WO3 is 40nm and O2 is 10nm.
-The WO3/Ag/WO3 transparent thin films are fabricated by the RF magnetron sputtering. This has a transmittance of front and rear about 90% in the visible light range and surface resistance of 6.41Ω/□. In this paper, we analyzed the surface characteristics caused by the working pressure and O2 plasma surface treatment to apply a transparent electrode that was prepared to the laminated structure with other materials. The working pressure was changed in the WO3 film to 10mTorr, 7mTorr, and 5mTorr, it showed a lower than roughness of conventional ITO. In addition, by 55.5774 J/m 2 at 5mTorr, it shows the hydrophobic property with lower process pressure. O2 plasma surface treatment was changed at the condisions of the RF power to 150W, 100W, and 50W and the process time to 240s, 180s, 120s, and 60s. The surface roughness are the maximum roughness(Rmax) 6.437nm and the average roughness(Rq) 0.827nm at RF power 150W, and the maximum roughness (Rmax) 6.880nm and the average roughness (Rq) 0.839nm at process time 240sec. It showed a lower value than the surface treatment. also about working pressure and process time is increased, it showed the hydrophobic.
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