The Overlay Metrology Advisory Group (OMAG) is a group comprised of technical experts in the field of optical metrology from International SEMATECH Member Companies, the National Institute of Standards and Technology (NIST) and suppliers of overlay metrology technology. This council created a specification for overlay benchmarking (Overlay Metrology Equipment Specification for Sub-130 nm Device Technology, Version 1.0) which indicates the critical parameters to be addressed in order to comply with the International Technology Roadmap for Semiconductors (ITRS) for the 130-nm technology node. This paper contains the methodologies and data from the benchmarking study using, a comparative range of repeatability, reproducibility, throughput, tool-induced shift (TIS) variability, and TIS through focus measurements. This paper intends to serve as a reference to the current tools' ability to meet the ITRS Roadmap specifications for the 130-nm technology node.
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