We have modified the properties of diamondlike atomic-scale composite (DLASC) material of various thicknesses (5–70 μm) by means of cw Ar-ion laser annealing using a focused beam (∼2 μm spot size). These DLASC films [amorphous “diamondlike/quartzlike” a-(C:H/Si:O)] constitute a novel class of diamond-related materials. The laser annealing effects were investigated by micro-Raman scattering. The structure of these films can be altered locally from amorphous to nanocrystalline depending not only on the parameters of the annealing process (annealing time, laser intensity) but also the mechanical properties (hardness, stress) of the films. For comparison purposes we also measured the effects of thermal annealing.
Positron annihilation spectroscopy (PAS) as a nondestructive, depth-sensitive probe was applied to study diamondlike nanocomposite (DLN) films. DLN films were deposited from a plasma discharge of polyphenilmetilsiloxane on rf-biased Si substrates. The film properties show systematic changes with variations in the voltage applied to the substrate. The film deposited at an rf bias voltage of 1000 V is stable under a 450 °C anneal. PAS results show that films with the highest breakdown voltage have the highest open-volume regions. Ellipsometric measurements and Raman scattering results from these films are also provided.
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