With ever-increasing laser power, the requirements for ultraviolet (UV) coatings increase continuously. The fundamental challenge for UV laser-resistant mirror coatings is to simultaneously exhibit a high reflectivity with a large bandwidth and high laser resistance. These characteristics are traditionally achieved by the deposition of laser-resistant layers on highly reflective layers. We propose a "reflectivity and laser resistance in one" design by using tunable nanolaminate layers that serve as an effective layer with a high refractive index and a large optical bandgap. An Al 2 O 3-HfO 2 nanolaminate-based mirror coating for UV laser applications is experimentally demonstrated using ebeam deposition. The bandwidth, over which the reflectance is >99.5%, is more than twice that of a traditional mirror with a comparable overall thickness. The laser-induced damage threshold is increased by a factor of~1.3 for 7.6 ns pulses at a wavelength of 355 nm. This tunable, nanolaminate-based new design strategy paves the way toward a new generation of UV coatings for high-power laser applications. The demand for laser-resistant mirror coatings is increasing in inertial confinement fusion (ICF) 1 , extreme light infrastructure 2 and other laser applications 3-6. An ideal ultraviolet (UV) laser mirror (UVLM) coating requires a high reflectivity with a large bandwidth and a high laser-induced damage threshold (LIDT). Unfortunately, these requirements are difficult to satisfy simultaneously, because, for example, a high reflectivity requires materials with a high refractive index (n), while higher n materials tend to have a smaller optical bandgap and therefore a lower LIDT. Traditionally, compromises are made for these seemingly contradictory requirements 7-10. We propose to use nanolaminate coatings for UVLMs. Nanolaminate materials 11-16 have properties that make them attractive for many applications 15,17-20. Our nanolaminate-based UVLM coatings are deposited using e-beam evaporation, a technique that is particularly favorable for large laser optics 10,21-24. This novel concept results in improved performance parameters and paves the way toward a new generation of UV coatings for highpower laser applications. In the traditional "reflectivity bottom and LIDT top" combination design (TCD coating) strategy, alternating high-n and low-n layers, such as HfO 2 and SiO 2 , are deposited on the substrate to obtain a high reflectivity, as illustrated in Fig. 1a (the high-n layer is denoted as C HN). Subsequently, pairs of high-n layers (with a relatively larger optical bandgap than C HN , denoted as layer C LB) and low-n layers, such as Al 2 O 3 and SiO 2 , or LaF 3 and AlF 3 , are deposited to achieve a high LIDT 8,9. Our new "reflectivity and laser resistance in one" strategy uses nanolaminate layers with co-evaporated interfaces, which are produced by alternating C LB layers and C HN layers, as shown in Fig. 1b. The C LB-C HN nanolaminate layers can be considered high-n layers, with a tunable refractive index and optical bandgap...