Fluorine incorporation during t h e deposition of silica layers is studied under MCVD conditions using C,F,Cl, as fluorine source. The experimental results are compared with known models of the incorporation mechanism. It is found that a gaspolid equilibrium during the consolidation step determines the final fluorine content of the layers.Der Fluoreinbau wahrend der Abscheidung von Quarzglasschichten wird unter MCVDBedingungen studiert, wobei C,F,Cl, als Fluorquelle Verwendung findet. Die experimentellen Ergebnisse werden mit bekannten Modellen Zuni Einbaumechanisnius verglichen. Es zeigt sich, dalj ein Gas-Festkorper-Gleichgewicht wahrend der Konsolidierungsphase den endgultigen Fluorgehalt der Schichten bestimmt.
We investigated the codoping of different high-silica glasses (GeO2 – SiO2, B2O3 – SiO2)
with fluorine with respect to the use of such glasses in actual optical fiber devices (fiber Bragg gratings,
fiber lasers and amplifiers, optical filters, etc). It could be shown that there is a strong interaction
between fluorine and the other dopants germanium and boron during gas phase deposition of
the glassy layers. The doping concentration in dependence on the experimental conditions (gas concentrations,
flow velocity, temperature) can be understood and quantitatively described on the basis
of the chemical thermodynamics (equilibrium chemistry) of the systems. This makes possible the
defined preparation of complex fiber structures in terms of refractive index profiles and multielement
distributions.
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