The role of metastables in electrical breakdown processes in a nitrogen-filled (13.33 mbar) diode has been investigated. This investigation was done by measurement of electrical breakdown time delay as a function of passive time tau , electrode gap d and E/p ratio in the diode with the bulk copper electrodes of which one is gold-plated. The results show that the gold film cathode is more sensitive to the secondary electron emission from its surface on metastable impact than that of bulk copper.
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