Plasma chemical reactions in complex Ar/C2H2 and Ar/C2H2/O2 radiofrequency plasmas with formation of nano-particles are investigated. Growing nano-particles cause a growth instability, which leads to temporal variations and a cyclic behaviour of plasma properties. Mass spectrometric observations show the consumption of C2H2 and the formation of polyacetylene C2nH2 molecules which increases with acetylene gas flow. The cycle frequency is a decreasing function of acetylene consumption. The addition of oxygen to the discharge reduces the cycle frequency and the formation of nano-particles and leads to the formation of CO and CO2 molecules presumably through the oxidation of C2H radicals which are formed in the discharge.
Articles you may be interested inExperimental investigations of silicon tetrafluoride decomposition in ECR discharge plasma Rev. Sci. Instrum. 82, 063503 (2011); 10.1063/1.3599618 Design and characterization of 2.45 GHz electron cyclotron resonance plasma source with magnetron magnetic field configuration for high flux of hyperthermal neutral beam Rev. Sci. Instrum. 81, 083301 (2010);This paper reports on an investigation of the hybrid pulsed sputtering source based on the combination of electron cyclotron wave resonance (ECWR) inductively coupled plasma and high power impulse magnetron sputtering (HiPIMS) of a Ti target. The plasma source, operated in an Ar atmosphere at a very low pressure of 0.03 Pa, provides plasma where the major fraction of sputtered particles is ionized. It was found that ECWR assistance increases the electron temperature during the HiPIMS pulse. The discharge current and electron density can achieve their stable maximum 10 ls after the onset of the HiPIMS pulse. Further, a high concentration of double charged Ti þþ with energies of up to 160 eV was detected. All of these facts were verified experimentally by time-resolved emission spectroscopy, retarding field analyzer measurement, Langmuir probe, and energy-resolved mass spectrometry. V C 2012 American Institute of Physics.
Highly ionized discharge for physical vapor deposition at very low pressure is presented in the paper. The discharge is generated by electron cyclotron wave resonance (ECWR) which assists with ignition of high power impulse magnetron sputtering (HiPIMS) discharge. The magnetron gun (with Ti target) was built into the single-turn coil RF electrode of the ECWR facility. ECWR assistance provides pre-ionization effect which allows significant reduction of pressure during HiPIMS operation down to p = 0.05 Pa; this is nearly more than an order of magnitude lower than at typical pressure ranges of HiPIMS discharges. We can confirm that nearly all sputtered particles are ionized (only Ti+ and Ti++ peaks are observed in the mass scan spectra). This corresponds well with high plasma density ne ∼ 1018 m−3, measured during the HiPIMS pulse.
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