A series of analogous nitratomethyl compounds of carbon and silicon of the formula types Me(3)ElCH(2)ONO(2) (1a/1b), Me(2)El(CH(2)ONO(2))(2) (2a/2b), MeEl(CH(2)ONO(2))(3) (3a/3b), (CH(2))(4)El(CH(2)ONO(2))(2) (4a/4b), and (CH(2))(5)El(CH(2)ONO(2))(2) (5a/5b) were synthesized [El = C (a), Si (b); (CH(2))(4)El = (sila)cyclopentane-1,1-diyl; (CH(2))(5)El = (sila)cyclohexane-1,1-diyl]. All compounds were characterized by using NMR, IR, and Raman spectroscopy and mass spectrometry. In addition, the crystal structures of Me(2)C(CH(2)ONO(2))(2) (2a), (CH(2))(4)C(CH(2)ONO(2))(2) (4a), Me(2)Si(CH(2)ONO(2))(2) (2b), and (CH(2))(5)Si(CH(2)ONO(2))(2) (5b) were determined by single-crystal X-ray diffraction. The gas-phase structures of the C/Si analogues 1a and 1b were determined by electron diffraction and compared with the results of quantum chemical calculations at different levels of theory. The thermal stabilities of the C/Si pairs 1a/1b-5a/5b were investigated by using DSC. In addition, their friction and impact sensitivities were measured with standard BAM methods. The extreme sensitivities of the silicon compounds 1b-5b compared to those of the corresponding carbon analogues 1a-5a were discussed in terms of the structures of the C/Si analogues and possible geminal Si...O interactions.
A series of (azidomethyl)silanes [Me 3 SiCH 2 N 3 (1b), Me 2 Si(CH 2 N 3 ) 2 (2b), MeSi(CH 2 N 3 ) 3 (3b), (CH 2 ) 4 Si(CH 2 N 3 ) 2 (4b), and (CH 2 ) 5 Si(CH 2 N 3 ) 2 (5b)] was synthesized, starting from the corresponding (chloromethyl)silanes 1a-3a or (iodomethyl)silanes 4a and 5a. Compounds 1b-5b were characterized by NMR, IR, and Raman
An investigation of the structures and chemistry of substituted hexamethyl disiloxanes ((XCH2)3Si)2O; X=F, Cl, Br, I, N3 , and ONO2) is reported. New synthetic routes to the precursor hexakis(chloromethyl)disiloxane are presented. The products with X=Cl, Br, I, and N3 were characterized by NMR, IR, and Raman spectroscopy. In addition, the single-crystal structures of the products with X=Cl, Br, and I are discussed in detail. The compounds with X=F and ONO2 were not obtained in their pure form; instead investigations of the decomposition products revealed their conversion into intermediates. Theoretical calculations of the gas-phase structures at the B3LYP/cc-pVDZ, B3LYP/3-21G, MP2/6-31G*, and MP2/3-21G levels of theory are used to explain the chemical and physical behavior of the compounds with X=Cl, Br, I, N3, and ONO2. A new decomposition pathway of hexakis(nitratomethyl)disiloxane is presented and is used to explain their remarkable instability. The energetic properties and values of the nitrate and azide derivatives were calculated at the CBS-4M level of theory by using the improved EXPLO5 computer code version 6.01.
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