The article focuses on depth-dependent visible band transmission effects in a symmetrical “insulator-metal-insulator” diffraction system based on a variable depth grating. These effects were studied both experimentally and theoretically in TM and TE polarizations. In particular, the existence of an optimized grating depth for plasmon-mediated resonant transmission was confirmed experimentally, and differences in TE and TM transmission behavior are discussed. We utilize a simple and flexible fabrication approach for rapid synthesis of apodized structures with adiabatically varying depth based on a beat pattern of two interferential lithography exposures. The present study can be useful in the fields of transmission-based optical security elements and biosensors.
The work considers the effect of extraordinary optical transmission (EOT) in polycrystalline arrays of nanopores fabricated via nanosphere photolithography (NPL). The use of samples with different qualities of polycrystalline structure allows us to reveal the role of disorder for EOT. We propose a phenomenological model which takes the disorder into account in numerical simulations and validate it using experimental data. Due to the NPL flexibility for the structure geometry control, we demonstrate the possiblity to partially compensate the disorder influence on EOT by the nanopore depth adjustments. The proposed experimental and theoretical results are promising to reveal the NPL limits for EOT-based devices and stimulate systematic studies of disorder compensation designs.
We propose a simple and flexible fabrication approach based on the moiré effect of photoresist gratings for rapid synthesis of apodized structures with continuously varying depth. Minor modifications in a standard laser interference lithography setup allow creating macroscopic, visible by naked eye moiré patterns that modulate the depth of subwavelength diffraction gratings. The spatial frequency of this modulation is easily controlled in a wide range, allowing to create a quasicrystal in extreme cases. Experimental results are confirmed by a theory with clear graphical solutions and numerical modeling. The method is universal and does not depend on a specific choice of photoresist and/or substrate materials, making it a promising choice for structured light applications, optical security elements or as a basic structuring method of complex optical devices.
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