Abstract-There are various techniques for the deposition of SiO 2 films on silicon. Flame Hydrolysis Deposition (FHD) techniques is the most economical technique for the deposition of SiO 2 films. In this technique the SiO 2 films are deposited by hydrolysis of SiCl 4 in a high temperature H 2 -O 2 flame. In the present study we present the growth of SiO 2 films by indigenously developed FHD system and organic compound Tetraethoxyorthosiliate/Tetraethoxysilane TEOS as source of silicon. The films deposited by the FHD system are porous and need annealing at higher temperatures for the densification. We present here for the first time direct dense glassy transparent SiO 2 films deposited by our FHD system. The optical properties of the deposited films were studied by ellipsometery. FTIR spectroscopy was carried out to study the various characteristic peaks of SiO 2 bonds. The peaks corresponding to Si-O-Si stretching, bending and rocking modes are observed at 1090 cm −1 , 812 cm −1 and 463 cm −1 respectively. The absence of peaks corresponding to the OH bond in the deposited film reveals that the deposited films are most suitable for the photonic devices application. The surface analysis was carried out using SEM. The EDAX of the deposited film confirms the composition of the Si and O in the deposited film.