A merger of organocatalysis and visible light photoredox catalysis performed in flow allowed access to a wide range of functionalized N-Aryl-substituted tetrahydoisoquinolines (THIQs) in a formal C-H oxidation/Mannich reaction. Strecker...
In this paper, fabrication of silicon microchannels with integrated obstacles
by using 25 wt.% tetramethylammonium hydroxide (TMAH) aqueous solution at
the temperature of 80?C is presented and analysed. We studied basic island
patterns, which present union of two symmetrical parallelograms with the
sides along predetermined crystallographic directions <n10> (2<n<8) and
<100>. Acute angles of the parallelograms were smaller than 45?. We have
derived analytical relations for determining dimensions of the integrated
obstacles. The developed etching technique provides reduction of the
distance between the obstacles. Before the experiments, we performed
simulations of pattern etching based on the level set method and presented
evolution of the etched basic patterns for the predetermined
crystallographic directions <n10>. Combination of basic patterns with sides
along the <610> and <100> crystallographic directions is used to fabricate a
matrix of two row of silicon obstacles in a microchannel. We obtained a good
agreement between the experimental results and simulations. Our results
enable simple and cost-effective fabrication of various complex microfluidic
silicon platforms with integrated obstacles.
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