About The AuthorSurface texturing is an indispensable process for solar cell fabrication. The interaction of the surface with the incoming sunlight is controlled by texturing in such a way that the absorption is maximized through multiple interactions. Wet and dry etching techniques have been used to create textured surfaces on solar cells. Other than standard alkaline texturing used by the industry, metal assisted etching (MAE) appears to be a promising texturing technique with greater potential application for multi-crystalline solar cell fabrication. It is possible to achieve both random and periodic patterns with MAE which is relatively cheaper than dry plasma etching techniques. In this study, periodic hole patterns with micron sized diameters and periodicity were aimed to be achieved. Etching rate was shown to be strongly dependent on the surface orientation. Uniformly distributed patterns with various diameter and period values were successfully obtained. Fabrication of solar cells on these surface patters were demonstrated. Performance of solar cells was evaluated through parameters like efficiency, open circuit voltage and short circuit current. In order to create a sustainable future for our planet while supplying continuously increasing energy demand of our society, we should use clean energy resources rather than burning fossil fuels like coal, natural gas, and liquid oils. Among the renewable and clean energy sources, solar energy has the greatest potential for providing all energy needs of the human being today and in the future. However, it is required to develop technologies to convert solar energy to other forms like electrical and mechanical energies with high efficiency and low cost. Thus, increasing solar cells efficiency and lowering the material and process costs are the main aim in most of the research efforts. Surface texturing is an indispensable method for light harvesting to develop high efficient solar cells. Metal assisted etching method offers a new and industrially compatible alternative for creating a variety of surface structures that may lead to better performances when compared with conventional pyramid textured counterparts. This work presents some new results on surface texturing by metal assisted etching. Schematic representation of periodic hole array formation with metal assisted etching process is shown in Figure 1. The hole pattern was first defined by the photoresist through a lithography process regardless of orientation. A thin layer of Ag was then evaporated on patterned surface which is followed by a lift off process which left behind circular metal dots on the surface shown in Figure 1-b. During MAE, Si under metal dots was etched away through chemical reactions described elsewhere, array of holes was then formed. In the final step of MAE process, the residual metal was removed using aqua regia solution [11]. Keywords Public Interest StatementIn general, texturing of the Si wafer surface is performed by creating random pyramids through anisotropic etching ...
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