Superhydrophobic and self-cleaning surfaces may arise due to interplay between nano/microstructures at the solid surface and the chemical properties of the topmost monolayer. In the present work, those relationships were investigated by Al substrate modifications via chemical functionalization with trimethoxypropylsilane dipping, and coating with a thin perfluorinated layer. The effect of the nano/micromorphology on the superhydrophobicity and hysteresis was studied using two main approaches: (i) chemical etching of Al substrates and chemical surface functionalization and (ii) anodic aluminum oxide template (nanoporous) generated on the etched Al substrates and functionalization as in approach i. The physical and chemical properties of the treated substrates were evaluated using water contact angle (WCA) and scanning electron microscopy and by chemical surface-sensitive techniques. The fabricated synthetic surface by approach i was superhydrophobic with a hysteresis of ∼17°. Samples prepared by approach ii showed a WCA of (165 ± 2)° with a very low hysteresis (<3°). A superhydrophobic nanostructure superimposed on a microstructure is the main cause of the self-cleaning properties obtained in the treated Al substrates.

Textures that resemble typical fern or bracken plant species (dendrite structures) were fabricated for liquid repellency by dipping copper substrates in a single-step process in solutions containing AgNO3 or by a simple spray liquid application. Superhydrophobic surfaces were produced using a solution containing AgNO3 and trimethoxypropylsilane (TMPSi), and superomniphobic surfaces were produced by a two-step procedure, immersing the copper substrate in a AgNO3 solution and, after that, in a solution containing 1H,1H,2H,2H-perfluorodecyltriethoxysilane (PFDTES). The simple functionalization processes can also be used when the superomniphobic surfaces were destroyed by mechanical stress. By immersion of the wrecked surfaces in the above solutions or by the spray method and soft heating, the copper substrates could be easily repaired, regenerating the surfaces' superrepellency to liquids. The micro- and nanoroughness structures generated on copper surfaces by the deposition of silver dendrites functionalized with TMPSi presented apparent contact angles greater than 150° with a contact angle hysteresis lower than 10° when water was used as the test liquid. To avoid total wettability with very low surface tension liquids, such as rapeseed oil and hexadecane, a thin perfluorinated coating of poly(tetrafluoroethylene) (PTFE), produced by physical vapor deposition, was used. A more efficient perfluorinated coating was obtained when PFDTES was used. The superomniphobic surfaces produced apparent contact angles above 150° with all of the tested liquids, including hexadecane, although the contact angle hysteresis with this liquid was above 10°. The coupling of dendritic structures with TMPSi/PTFE or directly by PFDTES coatings was responsible for the superrepellency of the as-prepared surfaces. These simple, fast, and reliable procedures allow the large area, and cost-effective scale fabrication of superrepellent surfaces on copper substrates for various industrial applications with the advantage of easy recovery of the surface repellency after damage.

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Dip-coated films, which are widely used in the coating industry, are usually measured by capacitive methods with micrometric precision. For the first time to our knowledge, we have applied an interferometric determination of the evolution of thickness in real time to nonvolatile Newtonian mineral oils with several viscosities and distinct dip withdrawing speeds. The evolution of film thickness during the process depends on time as t Ϫ1͞2 , in accordance with a simple model. Comparison with measured results with an uncertainty of Ϯ0.007 m͒ showed good agreement after the initial steps of the process had been completed.

Superhydrophobic self-cleaning surfaces were produced with simultaneous wide-angle optical transmittance in the near-infrared region and antireflection properties from combination of multi-scale surface topology based on silica nanoparticles, index grading and interference.

Micro- and nanostructures of Ti-γCu (γ = 0, 30, 50, 70, and 100 wt %) intermetallic alloys were produced through a single anodization step. It was found that the original alloy composition influences the final oxide morphology obtained after anodization which presented formation of a microstructure with nanotubes, nanoparticles or nanopillars on the surface. Pure Ti and Cu oxide metals and their alloys presented hydrophilic or superhydrophilic properties immediately after anodization. When the anodized pure metal and/or Ti-γCu surfaces were functionalized with trimethoxypropylsilane (TPMSi), by dipping and coating with a thin perfluorinated layer, the treated substrates became in all cases superhydrophobic (water contact angles in the range of 152-166°), showing excellent self-cleaning properties with hysteresis below 3°. These results can be explained by a combination of nanomicro morphologies with low surface energy compounds in the topmost monolayers. The decrease in hysteresis was associated with a higher M-OH bond concentration on the anodized surfaces, which allowed for more complete TMPSi coating coverage. This study also indicates that easy and effective fabrication of superhydrophobic surfaces in pure metals and alloys is possible without involving traditional multistep processes.

In dry sliding, the coefficient of friction depends on the material pair and contact conditions. If the material and operating conditions remain unchanged, the coefficient of friction is constant. Obviously, we can tune friction by surface treatments, but it is a nonreversible process. Here, we report active control of friction forces on TiO2 thin films under UV light. It is reversible and stable and can be tuned/controlled with the light wavelength. The analysis of atomic force microscopy signals by wavelet spectrograms reveals different mechanisms acting in the darkness and under UV. Ab initio simulations on UV light-exposed TiO2 show a lower atomic orbital overlapping on the surface, which leads to a friction reduction of up to 60%. We suggest that photocontrol of friction is due to the modification of atomic orbital interactions from both surfaces at the sliding interface.

Hydrogenated amorphous carbon thin films (a-C:H) have attracted much attention because of their surprising properties, including ultralow friction coefficients in specific conditions. Adhesion of a-C:H films on ferrous alloys is poor due to chemical and physical aspects, avoiding a widespread application of such a film. One possibility to overcome this drawback is depositing an interlayeran intermediate thin filmbetween the carbon-based coating and the substrate to improve chemical interaction and adhesion. Based on this, interlayers play a key role on a-C:H thin-film adhesion through a better chemical network structure at the outermost layer of the a-SiC x :H interlayer, i.e., the a-C:H/a-SiC x :H interface. However, despite the latest important advances on the subject, the coating adhesion continues being a cumbersome problem since it depends on multifactorial causes. Thus, the purpose of this paper is to report a standard protocol leading to surprising good results based on the control of the interfacial chemical bonding by properly biasing the substrate (between 500 and 800 V) during the a-SiC x :H interlayer deposition at an appropriate low temperature, by using hexamethyldisiloxane as precursor. The interlayers and the outermost interfaces were analyzed by a comprehensive set of techniques, including X-ray photoelectron spectroscopy, glow discharge optical emission spectroscopy, and Fourier transform infrared spectroscopy. Nanoscratch tests, complemented by scanning electron microscopy and energy-dispersive X-ray spectroscopy, were used to evaluate the critical load for delamination to certify and quantify the adhesion improvement. This study was important to identify the chemical local bonding of the elements at the interface and its local environment, including the in-depth chemical composition profile of the coating. An important effect is that the oxygen content decreases on increasing substrate bias voltage, improving the adhesion of the film. This is due to the fact that energetic ion hitting the growing interlayer breaks Si–O and C–O bonds, augmenting the content of Si–C and C–C bonds at the outermost interface of the a-SiC x :H interlayer and enhancing the a-C:H coating adhesion. Moreover, the combination of high bias voltage (800 V) and low temperature (150 °C) during the a-SiC x :H interlayer deposition allows good adhesion of a-C:H thin films due to sputtering of light elements like oxygen. Therefore, an appropriated bias and temperature combination can open new pathways in a-C:H thin-film deposition at low temperatures. These results are particularly interesting for temperature-sensible metal alloys, where well-adhered a-C:H thin films are mandatory for tribological applications.