No abstract

Focused-electron-beam-induced deposition (FEBID) is a powerful nanopatterning technique where electrons trigger the local dissociation of precursor molecules, leaving a deposit of non-volatile dissociation products. The fabrication of high-purity gold deposits via FEBID has significant potential to expand the scope of this method. For this, gold precursors that are stable under ambient conditions but fragment selectively under electron exposure are essential. Here, we investigated the potential gold precursor (CH3)AuP(CH3)3 using FEBID under ultra-high vacuum (UHV) and spectroscopic characterization of the corresponding metal-containing deposits. For a detailed insight into electron-induced fragmentation, the deposit’s composition was compared with the fragmentation pathways of this compound through dissociative ionization (DI) under single-collision conditions using quantum chemical calculations to aid the interpretation of these data. Further comparison was made with a previous high-vacuum (HV) FEBID study of this precursor. The average loss of about 2 carbon and 0.8 phosphor per incident was found in DI, which agreed well with the carbon content of the UHV FEBID deposits. However, the UHV deposits were found to be as good as free of phosphor, indicating that the trimethyl phosphate is a good leaving group. Differently, the HV FEBID experiments showed significant phosphor content in the deposits.

Understanding the adsorption of organic molecules on surfaces is of essential importance for many applications. Adsorption energies are typically measured using temperature-programmed desorption. However, for large organic molecules, often only desorption of the multilayers is possible, while the bottom monolayer in direct contact to the surface cannot be desorbed without decomposition. Nevertheless, the adsorption energies of these directly adsorbed molecules are the ones of the most interest. We use a layerexchange process investigated with X-ray photoelectron spectroscopy to compare the relative adsorption energies of several metalated tetraphenylporphyrins on rutile TiO 2 (110) 1 × 1. We deposit a mixture of two different molecules, one on top of the other, and slowly anneal above their multilayer desorption temperature. During the slow heating, the molecules begin to diffuse between the layers and the molecules with the stronger interaction with the surface displace the weaker-interacting molecules from the surface and push them into the multilayer. The multilayers eventually desorb, leaving behind a monolayer of strongly interacting molecules. From the ratio of the two different porphyrin molecules in the residual monolayer and the desorbed multilayer, we can calculate the equilibrium constant of the layer-exchange process and thereby the difference in adsorption energy between the two different porphyrin molecules.