Single nitride nanowire core/shell n-p photodetectors are fabricated and analyzed. Nanowires consisting of an n-doped GaN stem, a radial InGaN/GaN multiple quantum well system and a p-doped GaN external shell were grown by catalyst-free metal–organic vapour phase epitaxy on sapphire substrates. Single nanowires were dispersed and the core and the shell regions were contacted with a metal and an ITO deposition, respectively, defined using electron beam lithography. The single wire photodiodes present a response in the visible to UV spectral range under zero external bias. The detector operation speed has been analyzed under different bias conditions. Under zero bias, the −3 dB cut-off frequency is ~200 Hz for small light modulations. The current generation was modeled using non-equilibrium Green function formalism, which evidenced the importance of phonon scattering for carrier extraction from the quantum wells.
Different types of buffer layers like InGaN underlayer (UL) and InGaN/GaN superlattices are now well-known to significantly improve the efficiency of c-plane InGaN/GaN based light emitting diodes (LEDs). The present work investigates the role of two different kinds of pregrowth layers (low In-content InGaN UL and GaN UL namely "GaN spacer") on the emission of core-shell m-plane InGaN/GaN single quantum well (QW) grown around Si-doped !̅-GaN microwires obtained by silane-assisted MOVPE. According to photo-and cathodoluminescence measurements performed at room temperature, an improved efficiency of light emission at 435 nm with internal quantum efficiency > 15 % has been achieved by adding a GaN spacer prior to the growth of QW. As revealed by scanning transmission electron microscopy, an ultra-thin residual layer containing Si located at the wire sidewall surfaces favors the formation of highdensity of extended defects nucleated at the first InGaN QW. This contaminated residual incorporation is buried by the growth of GaN spacer and avoids the structural defect formation, therefore explaining the improved optical efficiency. No further improvement is observed by adding the InGaN UL to the structure, which is confirmed by comparable values of the effective carrier lifetime estimated from time-resolved (TR) experiments. Contrary to the case of planar cplane QW where the improved efficiency is attributed to a strong decrease of point defects, the addition of an InGaN UL seem to have no influence in the case of radial m-plane QW.
We demonstrate green emission from InGaN/GaN multiple quantum wells (MQWs) grown on m-plane sidewalls of GaN wires. To tune the emission wavelength, InGaN radial wells were grown by metal–organic vapor phase epitaxy (MOVPE) at decreasing temperatures ranging from 710 down to 620 °C to increase the In incorporation. A comprehensive investigation combining structural and optical analyses demonstrates that the green emission from the nonpolar m-plane wire sidewalls is achieved for the wells grown at 650 °C (namely, for 2.7 nm thick wells sandwiched by 11 nm thick GaN barriers). The observed emission wavelength of 500–550 nm is consistent with an average In-content of MQWs measured in the range of 24 ± 4% by energy dispersive X-ray (EDX) and atom probe tomography (APT). Single wires were electrically contacted and the green electroluminescence from m-plane facets was established on single wire-LED devices. This demonstrates the possibility to produce green emitters with core–shell wire LEDs elaborated by industrial and scalable MOVPE technique.
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