The charge state of individually addressable impurities in semiconductor material was manipulated with a scanning tunneling microscope. The manipulation was fully controlled by the position of the tip and the voltage applied between tip and sample. The experiments were performed at low temperature on the (110) surface of silicon doped GaAs. Silicon donors up to 1 nm below the surface can be reversibly switched between their neutral and ionized state by the local potential induced by the tip. By using ultrasharp tips, the switching process occurs close enough to the impurity to be observed as a sharp circular feature surrounding the donor. By utilizing the controlled manipulation, we were able to map the Coulomb potential of a single donor at the semiconductor-vacuum interface.

Influence of a static magnetic field on the photoluminescence of an ensemble of nitrogen-vacancy color centers in a diamond single-crystal Appl. Phys. Lett. 95, 133101 (2009);The localized spin triplet ground state of a nitrogen vacancy ͑NV͒ center in diamond can be used in atomic-scale detection of local magnetic fields. Here we present a technique using ensembles of these defects in diamond to image fields around magnetic structures. We extract the local magnetic field vector by probing resonant transitions of the four fixed tetrahedral NV orientations. In combination with confocal microscopy techniques, we construct a two-dimensional image of the local magnetic field vectors. Measurements are done in external fields less than 50 G and under ambient conditions.

We measured the ionization threshold voltage of individual impurities close to a semiconductor-vacuum interface, where we use the STM tip to ionize individual donors. We observe a reversed order of ionization with depth below the surface, which proves that the binding energy is enhanced towards the surface. This is in contrast to the predicted reduction for a Coulombic impurity in the effective mass approach. We can estimate the binding energy from the ionization threshold and show experimentally that in the case of silicon doped gallium arsenide the binding energy gradually increases over the last 1.2 nm below the (110) surface.